Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A2 | P43004 | 4/20 | 0.41 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.41 |
| ▸ | GABRR1 | P24046 | 5/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | GABRR2 | P28476 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14818195 | 0.92 | SLC1A2 (0.39) | SLC1A2SLC1A1GABRR1PKM | |
| SCHEMBL13418022 | 0.85 | SLC1A2 (0.35) | SLC1A2SLC1A1 | |
| SCHEMBL12877955 | 0.81 | SLC1A2 (0.33) | SLC1A2SLC1A1 | |
| SCHEMBL15729907 | 0.79 | — | — | |
| SCHEMBL21654483 | 0.79 | CYP1A2 (0.37) | MEN1KMT2A | |
| SCHEMBL9908326 | 0.79 | CYP1A2 (0.37) | MEN1KMT2A | |
| SCHEMBL7699619 | 0.78 | SLC1A2 (0.41) | SLC1A2SLC1A1GABRR1PKMGABRR2 | |
| SCHEMBL7700820 | 0.78 | SLC1A2 (0.41) | SLC1A2SLC1A1GABRR1PKMGABRR2 | |
| SCHEMBL10557954 | 0.77 | SLC1A2 (0.47) | SLC1A2SLC1A1GABRR1GABRR2MEN1 | |
| SCHEMBL8995147 | 0.77 | SLC1A2 (0.47) | SLC1A2SLC1A1GABRR1GABRR2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20220206385-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-30 | — | — | US | disclosed |
| US-9896537-B2 | Norbornanyl rosin resin and process for preparing same | YU HUI (US) | 2018-02-20 | — | — | US | disclosed |
| US-9546133-B2 | Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-01-17 | — | — | US | disclosed |
| EP-2088466-B1 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | TOKYO OHKA KOGYO CO LTD (JP) | 2016-10-26 | — | — | EP | disclosed |
| US-9423689-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-23 | — | — | US | disclosed |
| US-9353213-B2 | Functional norbornanyl ester derivatives, polymers and process for preparing same | YU HUI (US) | 2016-05-31 | — | — | US | disclosed |
| US-20160122469-A1 | Functional norbornanyl ester derivatives, polymers and process for preparing same | YU HUI (US) | 2016-05-05 | — | — | US | disclosed |
| US-20160023992-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | MARUZEN PETROCHEMICAL CO., LTD. | 2016-01-28 | — | — | US | disclosed |
| US-20070298355-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-20070060663-A1 | Photocurable composition, photocurable ink composition, printing method and resist composition using the same | KONICA MINOLTA MEDICAL & GRAPHIC, INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070060663-A1 | Photocurable composition, photocurable ink composition, printing method and resist composition using the same | KONICA MINOLTA MEDICAL & GRAPHIC, INC. | 2007-03-15 | — | — | US | disclosed |
| US-7186495-B2 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-7186495-B2 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-7183368-B2 | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-02-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160122469-A1 | Functional norbornanyl ester derivatives, polymers and process for preparing same | CYP1B1, DECR1, CAD | SLC1A2 4179/4885SLC1A1 3827/4885GABRR1 1793/4885 |
| US-20160023992-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | ORAI1, STOM, SORT1 | SLC1A2 4094/4885SLC1A1 3729/4885GABRR1 3518/4885 |
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | HAAO, HPD, IL4 | SLC1A2 4627/4885SLC1A1 4295/4885GABRR1 3865/4885 |
| US-20220206385-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | RER1, REV1, ABCC1 | SLC1A2 4069/4885SLC1A1 3518/4885GABRR1 360/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.