Potassium Ion

Potassium Ion

SCHEMBL8023908

O=C([O-])c1ccc(CCl)cc1.[K+]

nearest known ligand 0.95

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 18/20 0.95
▸ CA1 P00915 17/20 0.95
▸ CA4 P22748 1/20 0.44
▸ MAPT P10636 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8029235 0.95 CA2 (1.00) CA2CA1CA4MAPT
Terephthalic Acid SCHEMBL31095057 0.80 CA2 (0.68) CA2CA1CA4MAPT
Terephthalic Acid SCHEMBL107909 0.80 CA2 (0.68) CA2CA1CA4MAPT
SCHEMBL1559089 0.78 CA1 (0.67) CA2CA1MAPT
Potassium Ion SCHEMBL6911291 0.77 ALDH1A1 (0.61) CA2CA1MAPT
Terephthalic Acid SCHEMBL15641843 0.77 CA2 (0.74) CA2CA1CA4MAPT
Terephthalic Acid SCHEMBL7910695 0.77 CA2 (0.65) CA2CA1CA4MAPT
Terephthalic Acid SCHEMBL9930546 0.77 CA2 (0.65) CA2CA1CA4MAPT
SCHEMBL13683319 0.76 CA1 (0.64) CA2CA1MAPT
SCHEMBL40281 0.76 CA1 (0.64) CA2CA1CA4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0779318-B1 Silicon-containing block copolymer WAKO PURE CHEMICAL INDUSTIES L (JP) 2000-02-16 — — EP disclosed
US-5760136-A FORMING AN ADDITION-CONDENSATION COPOLYMER BY POLYMERIZING AN AZO-CONTAINING POLYSILOXANE AND AN UNSATURATED MONOMER; CATIONIC AND NONIONIC POLYMERS; POLYAMPHOLYTES; COATINGS; ADHESIVES; PAINTS; HAIR COSMETICS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1998-06-02 — — US disclosed
EP-0779318-A1 Silicon-containing block copolymer Wako Pure Chemical Industries, Ltd. (JP) 1997-06-18 — — EP disclosed
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