SCHEMBL805292

SCHEMBL805292

CC(C)C(=O)OCC(F)(F)C(F)F

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.42
GAA P10253 1/20 0.42
ALDH1A1 P00352 5/20 0.41
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
NPSR1 Q6W5P4 3/20 0.41
LMNA P02545 2/20 0.41
MAPK1 P28482 1/20 0.41
HTT P42858 1/20 0.40
TSHR P16473 2/20 0.39
MAPT P10636 2/20 0.36
TDP1 Q9NUW8 2/20 0.35
KDM4E B2RXH2 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25981449 0.89 POLB (0.43) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL17413828 0.83 HTT (0.38) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL13610605 0.83 POLB (0.40) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL16160720 0.83 POLB (0.40) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL25858052 0.82 HTT (0.43) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL12939342 0.82 POLB (0.39) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL13610612 0.80 POLB (0.38) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL2536484 0.80 POLB (0.43) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL308634 0.79 TSHR (0.41) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL805296 0.79 HTT (0.62) POLBALDH1A1MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4318629-A1 PRIMER FOR POWER STORAGE DEVICE ELECTRODES, COMPOSITION FOR FORMING PRIMER LAYER, ELECTRODE FOR POWER STORAGE DEVICES, AND SECONDARY BATTERY AGC INC. (JP) 2024-02-07 EP disclosed
US-20230420686-A1 PRIMER FOR POWER STORAGE DEVICE ELECTRODE, COMPOSITION FOR FORMING PRIMER LAYER, ELECTRODE FOR POWER STORAGE DEVICE, AND SECONDARY BATTERY AGC Inc. (JP) 2023-12-28 US disclosed
US-9760005-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-12 US disclosed
US-9644056-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-05-09 US disclosed
US-20160237190-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-18 US disclosed
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-03 US disclosed
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 US disclosed
EP-2450406-B1 FLUORINE-CONTAINING COPOLYMER COMPOSITION AND METHOD FOR PRODUCING SAME ASAHI GLASS CO LTD (JP) 2015-10-14 EP disclosed
WO-2014163055-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE USING SAME 宇部興産株式会社 (JP) 2014-10-09 WO disclosed
US-8331015-B2 Display medium and display device FUJI XEROX CO., LTD. (JP) 2012-12-11 US disclosed
EP-2450406-A1 FLUORINE-CONTAINING COPOLYMER COMPOSITION AND METHOD FOR PRODUCING SAME Asahi Glass Company, Limited (JP) 2012-05-09 EP disclosed
US-20120108723-A1 FLUOROCOPOLYMER COMPOSITION AND ITS PRODUCTION PROCESS ASAHI GLASS COMPANY, LIMITED (JP) 2012-05-03 US disclosed
US-20120069423-A1 DISPLAY MEDIUM AND DISPLAY DEVICE FUJI XEROX CO., LTD. (JP) 2012-03-22 US disclosed
US-20070002232-A1 Optical compensation film, polarizing plate and liquid crystal display device FUJI PHOTO FILM CO., LTD. (JP) 2007-01-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN XDH, HAX1, MLX POLB 1000/4885GAA 2846/4885ALDH1A1 2530/4885
US-20160237190-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION HAX1, F11, RXRA POLB 2949/4885GAA 4209/4885ALDH1A1 3120/4885
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, AFF1, FRG1 POLB 3385/4885GAA 4651/4885ALDH1A1 2206/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.