Methyl Alcohol

Methyl Alcohol

SCHEMBL8058445

CC(C)C(C)C(=O)C(C)C(C)C.CO

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.33
SLC7A5 Q01650 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL79569 0.96 TP53 (0.35) TP53SLC7A5
Hydrogen Peroxide SCHEMBL8161423 0.92 TP53 (0.41) TP53SLC7A5
Formaldehyde SCHEMBL79597 0.89 SLC7A5 (0.32) TP53SLC7A5
Acetone SCHEMBL5322639 0.89 LMNA (0.43) TP53SLC7A5
Isopropyl Alcohol SCHEMBL1325429 0.89 ALDH1A1 (0.43) TP53SLC7A5
SCHEMBL10486769 0.86 ALDH1A1 (0.40) TP53SLC7A5
Acetic Acid SCHEMBL6444292 0.86 FFAR3 (0.47) TP53SLC7A5
Alcohol SCHEMBL8986304 0.83 TSHR (0.38)
Hexane SCHEMBL9857695 0.83 CA1 (0.43)
SCHEMBL4092739 0.81 SLC7A5 (0.32) TP53SLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9624356-B2 Ultraviolet absorber, composition for forming a resist under layer film, and patterning process SHIN-ETSU CHEMIAL CO., LTD (JP) 2017-04-18 US disclosed
US-9522979-B2 Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-20 US disclosed
US-20160229960-A1 FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed
US-9315670-B2 Composition for forming resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-19 US disclosed
US-20160053087-A1 ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-25 US disclosed
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140235796-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-21 US disclosed
US-20140193975-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 US disclosed
EP-2657240-A1 Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2013-10-30 EP disclosed
US-20130280912-A1 SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-24 US disclosed
US-6156908-A Procedure for the manufacture of 3-amino-2-oxo-pyrrolidines, new intermediates and their use ROHM GESELLSCHAFT, GMBH (DE) 2000-12-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160053087-A1 ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS CDH1, KDM1A, DSG1 TP53 3817/4885SLC7A5 2725/4885
US-20160229960-A1 FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN RFT1, FEM1B, RER1 TP53 3448/4885SLC7A5 1636/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.