SCHEMBL8138441

SCHEMBL8138441

O=[N+]([O-])c1cccc(C(F)(F)F)c1COS(=O)(=O)c1ccccc1Cc1c([N+](=O)[O-])cccc1C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.39
ALDH1A1 P00352 4/20 0.38
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
PTGES O14684 1/20 0.36
CA12 O43570 1/20 0.36
LMNA P02545 2/20 0.35
CYP19A1 P11511 1/20 0.35
TSHR P16473 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
MMP1 P03956 1/20 0.35
MMP2 P08253 1/20 0.35
MMP9 P14780 1/20 0.35
MMP8 P22894 1/20 0.35
MMP13 P45452 1/20 0.35
NPSR1 Q6W5P4 1/20 0.34
IDO1 P14902 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28285046 0.86 KMT2A (0.38) ATMALDH1A1KMT2AMEN1LMNA
SCHEMBL8014629 0.84 ALDH1A1 (0.47) ATMALDH1A1PTGESTSHRNPSR1
SCHEMBL8137157 0.82 ATM (0.41) ATMALDH1A1KMT2AMEN1PTGES
SCHEMBL196874 0.81 HSD11B1 (0.41) ATMALDH1A1KMT2AMEN1CA12
SCHEMBL14509459 0.81 ATM (0.38) ATMALDH1A1KMT2AMEN1PTGES
SCHEMBL14509395 0.81 CA2 (0.41) ATMALDH1A1KMT2AMEN1PTGES
SCHEMBL29516013 0.81 HSD11B1 (0.41) ATMALDH1A1KMT2AMEN1CA12
SCHEMBL197141 0.80 LMNA (0.40) ATMALDH1A1LMNAIDO1HTT
SCHEMBL7788635 0.80 ALDH1A1 (0.40) ATMALDH1A1KMT2AMEN1LMNA
SCHEMBL28038938 0.79 LMNA (0.40) ATMALDH1A1LMNAIDO1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6159665-A Processes using photosensitive materials including a nitro benzyl ester photoacid generator LUCENT TECHNOLOGIES INC. (US) 2000-12-12 US disclosed
US-5830619-A BLEND OF POLYMER AND ACID GENERATING MATERIAL LUCENT TECHNOLOGIES INC. (US) 1998-11-03 US disclosed
EP-0631188-B1 Resist materials AT & T CORP (US) 1997-09-10 EP disclosed
EP-0631188-A1 Resist materials AT&T Corp. (US) 1994-12-28 EP disclosed