Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL5684461 | 1.00 | — | — | |
| Tetramethylammonium Ion SCHEMBL15205926 | 1.00 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL28549788 | 1.00 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL8586405 | 1.00 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL781770 | 1.00 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL9547013 | 1.00 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL7028672 | 1.00 | — | — | |
| Tetramethylammonium Ion SCHEMBL7166906 | 0.91 | CHRNB2 (0.67) | — | |
| Tetramethylammonium Ion SCHEMBL9114017 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL3199241 | 0.91 | CHRNB2 (0.67) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109494155-B | Method, apparatus and system for forming sigma-shaped source/drain lattice | 格芯(美国)集成电路科技有限公司 | 2022-04-15 | — | — | CN | claimed |
| US-9335475-B2 | Method of manufacturing an optical device having a stepwise or tapered light input/output part | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 2016-05-10 | — | — | US | claimed |
| US-20150086153-A1 | OPTICAL DEVICE HAVING A STEPWISE OR TAPERED LIGHT INPUT/OUTPUT PART AND MANUFACTURING METHOD THEREFOR | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 2015-03-26 | — | — | US | claimed |
| US-5876266-A | Polishing pad with controlled release of desired micro-encapsulated polishing agents | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-03-02 | — | — | US | claimed |
| EP-0801089-A1 | Preparation of branched polycarbonates | THE COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 1997-10-15 | — | — | EP | claimed |
| US-20250349736-A1 | METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR DEVICE | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2025-11-13 | — | — | US | disclosed |
| WO-2025071426-A1 | RAPID METHOD FOR ISOLATION OF MICROPLASTICS FROM MILK, YOGURT, SOUR CREAM AND BUTTER | UNIVERSITATEA "VALAHIA" DIN TÂRGOVIŞTE (RO) | 2025-04-03 | — | — | WO | disclosed |
| CN-119630056-A | Full-gate-all-around integrated circuit structure with differential nanowire thickness and gate oxide thickness | 英特尔公司 | 2025-03-14 | — | — | CN | disclosed |
| EP-3827241-B1 | DISSOCIATION OF BIOLOGICAL SAMPLES | GOLDSBOROUGH ANDREW SIMON (FR) | 2024-03-13 | — | — | EP | disclosed |
| WO-2024019139-A1 | COMPOSITION | 株式会社日本触媒 | 2024-01-25 | — | — | WO | disclosed |
| WO-2024014330-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME | 三菱瓦斯化学株式会社 | 2024-01-18 | — | — | WO | disclosed |
| US-20230341763-A1 | PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD OF MANUFACTURING PELLICLE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | MITSUI CHEMICALS, INC. (JP) | 2023-10-26 | — | — | US | disclosed |
| EP-1044616-A2 | Acrylic resin glove and internal surface treating agent thereof | Sumitomo Rubber Industries, Ltd. (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0913921-A1 | Method for manufacturing a semiconductor material integrated micractuator, in particular for a hard disc mobile read/write head, and a microactuator obtained thereby | STMicroelectronics S.r.l. (IT) | 1999-05-06 | — | — | EP | disclosed |
| US-5876266-A | Polishing pad with controlled release of desired micro-encapsulated polishing agents | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-03-02 | — | — | US | disclosed |
| EP-0895276-A1 | Process for manufacturing integrated microstructures of single-crystal semiconductor material | STMicroelectronics S.r.l. (IT) | 1999-02-03 | — | — | EP | disclosed |
| US-5549989-A | ELECTRODES ARE TRANSITION METAL OXIDES CAPABLE OF FORMING MULTIPLE OXIDES, BUT NOT CAPABLE OF FORMING METAL HYDRIDES | MOTOROLA, INC. (US) | 1996-08-27 | — | — | US | disclosed |
| US-5215973-A | Treating anhydrous form with water; crystallization from organic solvent of medium polarity; antilipemic agents | MAGIS FARMACEUTICI S.P.A. (IT) | 1993-06-01 | — | — | US | disclosed |
| EP-0502357-A1 | Optically active and racemic hydrated diacetylesters of alpha-glycero-phosphoryl-choline | MAGIS FARMACEUTICI S.p.A. (IT) | 1992-09-09 | — | — | EP | disclosed |
| US-5063134-A | Silicon-containing novolaks for multilayer photoresists developed by an aqueous alkaline solution; oxygen-plasma resistance; resolution | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-11-05 | — | — | US | disclosed |