Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL8586405

C[N+](C)(C)C.C[N+](C)(C)C.O

nearest known ligand 0.80

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.80
CHRNA7 P36544 1/20 0.80
CHRNA4 P43681 1/20 0.80

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetramethylammonium Ion SCHEMBL845827 1.00
Tetramethylammonium Ion SCHEMBL5684461 1.00
Tetramethylammonium Ion SCHEMBL15205926 1.00 CHRNB2 (0.80) CHRNB2CHRNA7CHRNA4
Tetramethylammonium Ion SCHEMBL28549788 1.00 CHRNB2 (0.80) CHRNB2CHRNA7CHRNA4
Tetramethylammonium Ion SCHEMBL781770 1.00 CHRNB2 (0.80) CHRNB2CHRNA7CHRNA4
Tetramethylammonium Ion SCHEMBL9547013 1.00 CHRNB2 (0.80) CHRNB2CHRNA7CHRNA4
Tetramethylammonium Ion SCHEMBL7028672 1.00
Tetramethylammonium Ion SCHEMBL7166906 0.91 CHRNB2 (0.67) CHRNB2CHRNA7CHRNA4
Tetramethylammonium Ion SCHEMBL9114017 0.91
Tetramethylammonium Ion SCHEMBL3199241 0.91 CHRNB2 (0.67) CHRNB2CHRNA7CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106029046-B Dental composition and application thereof 3M创新有限公司 2019-04-05 CN disclosed
CN-102985052-B Dental composition, assembly box set and application thereof 3M创新有限公司 2016-10-19 CN disclosed
CN-106029046-A Dental composition and use thereof 3M创新有限公司 2016-10-12 CN disclosed
CN-106029044-A Adhesive bonding composition and use thereof 3M创新有限公司 2016-10-12 CN disclosed
CN-106029045-A Dental composition and use thereof 3M创新有限公司 2016-10-12 CN disclosed
CN-101808981-B Methacrylate based monomers containing a urethane linkage, process for production and use thereof 3M INNOVATIVE PROPERTIES CO 2014-07-30 CN disclosed
CN-102985052-A Dental composition, kit of parts and use thereof 3M INNOVATIVE PROPERTIES CO 2013-03-20 CN disclosed
CN-101610749-B Dental filler and methods 3M INNOVATIVE PROPERTIES CO 2013-01-02 CN disclosed
CN-101018818-B Dental compositions conataining carbosilane polymers 3M INNOVATIVE PROPERTIES CO 2012-11-14 CN disclosed
CN-1997334-B Dental compositions containing carbosilane monomers 3M INNOVATIVE PROPERTIES CO 2012-03-21 CN disclosed
CN-101808981-A Methacrylate based monomers containing a urethane linkage, process for production and use thereof 3M INNOVATIVE PROPERTIES CO 2010-08-18 CN disclosed
CN-101610749-A Dental filler and method 3M INNOVATIVE PROPERTIES CO (US) 2009-12-23 CN disclosed
CN-100415198-C Hardenable self-supporting structures and methods 3M INNOVATIVE PROPERTIES CO (US) 2008-09-03 CN disclosed
CN-101018818-A Dental compositions conataining carbosilane polymers 3M INNOVATIVE PROPERTIES CO (US) 2007-08-15 CN disclosed
CN-1997334-A Dental compositions containing carbosilane monomers 3M INNOVATIVE PROPERTIES CO (US) 2007-07-11 CN disclosed
CN-1541084-A Hardenable self-supporting structures and methods 3M 2004-10-27 CN disclosed
US-5717057-A INHIBITING DISCOLORATION BY CONDENSATION POLYMERIZING IN PRESENSE OF POLYMERIZATION CATALYST DISSOLVING OR DISPERSING IN STARTING MATERIAL A CARBONIC ACID DIESTER, A MONOHYDROXY COMPOUND OR AN AQUEOUS SOLUTION OF MONOHYDROXY COMPOUND GENERAL ELECTRIC COMPANY (US) 1998-02-10 US disclosed