SCHEMBL8517588

SCHEMBL8517588

CCCCN(CC(=O)O)c1ccc(NC(=O)O)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.45
RAB9A P51151 4/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
NOX1 Q9Y5S8 2/20 0.45
MAPT P10636 4/20 0.43
ALDH1A1 P00352 3/20 0.43
MCL1 Q07820 2/20 0.43
KDM4E B2RXH2 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
HPGD P15428 1/20 0.43
MAPK1 P28482 1/20 0.43
CNR2 P34972 1/20 0.43
ADRB2 P07550 1/20 0.42
NPSR1 Q6W5P4 1/20 0.41
HDAC6 Q9UBN7 2/20 0.40
HDAC3 O15379 1/20 0.40
HDAC4 P56524 1/20 0.40
HDAC1 Q13547 1/20 0.40
HDAC7 Q8WUI4 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8517506 0.91 RAB9A (0.47) NPC1RAB9AMEN1KMT2ANOX1
SCHEMBL3347562 0.86 KEAP1 (0.46) ALDH1A1KDM4ESMN1; SMN2CNR2EGFR
SCHEMBL8517179 0.84 RAB9A (0.58) NPC1RAB9AMEN1KMT2ANOX1
SCHEMBL3342781 0.82 CNR2 (0.48) NPC1RAB9AMEN1KMT2AMAPT
SCHEMBL3347146 0.81 CNR2 (0.47) MEN1KMT2AMAPTALDH1A1KDM4E
SCHEMBL3341126 0.81 EGFR (0.42) MEN1KMT2AMAPTALDH1A1KDM4E
SCHEMBL7527244 0.80 RAB9A (0.53) NPC1RAB9AMEN1KMT2ANOX1
SCHEMBL8373743 0.79 L3MBTL1 (0.56) NPC1RAB9AMEN1KMT2AMAPT
SCHEMBL8376259 0.78 ESR1 (0.47) NPC1RAB9AMEN1KMT2AMAPT
SCHEMBL7643003 0.78 PLA2G2A (0.46) NPC1RAB9AALDH1A1KDM4ECNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0636939-B1 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL CO LTD (JP) 1999-03-03 EP disclosed
US-5811218-A IMPROVED PHOTOSENSITIVITY FOR MATERIALS CONTAINING POLYAMIC ACID AND ADDITION POLYMERIZABLE COMPOUND USED FOR PATTERN FORMATION HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-09-22 US disclosed
EP-0636939-A2 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-02-01 EP disclosed