Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR1H2 | P55055 | 14/20 | 0.39 |
| ▸ | NR1H3 | Q13133 | 14/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | MLYCD | O95822 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15582365 | 0.91 | NR1H2 (0.35) | NR1H2NR1H3SMN1; SMN2MEN1ALOX15 | |
| SCHEMBL25779689 | 0.82 | HSD11B1 (0.39) | NR1H3CES2 | |
| SCHEMBL15582371 | 0.81 | HTT (0.45) | NR1H3TSHRCES2 | |
| SCHEMBL20615653 | 0.80 | CES2 (0.54) | CES2 | |
| SCHEMBL86047 | 0.79 | NR1H3 (0.53) | NR1H2NR1H3SMN1; SMN2MLYCD | |
| SCHEMBL8586265 | 0.79 | NR1H2 (0.48) | NR1H2NR1H3SMN1; SMN2MEN1ALOX15 | |
| SCHEMBL9657149 | 0.76 | L3MBTL1 (0.33) | TSHR | |
| SCHEMBL21347765 | 0.73 | GABRA1 (0.41) | SMN1; SMN2MEN1ALOX15MAPK1KMT2A | |
| SCHEMBL23059982 | 0.73 | GABRA1 (0.50) | NR1H2NR1H3SMN1; SMN2MEN1ALOX15 | |
| SCHEMBL10215034 | 0.73 | MLYCD (0.48) | NR1H2NR1H3SMN1; SMN2MEN1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9507262-B2 | Resist top-coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9274428-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-01 | — | — | US | disclosed |
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20150234274-A1 | RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |
| US-8951712-B2 | Resist protective film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-20150030983-A1 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-01-29 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140080064-A1 | RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |