SCHEMBL8778288

SCHEMBL8778288

O=C(ON(C(=O)c1ccccc1)C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.54
F2 P00734 1/20 0.54
TSHR P16473 4/20 0.50
KMT2A Q03164 4/20 0.48
TDP1 Q9NUW8 3/20 0.48
SLC6A2 P23975 1/20 0.48
SLC6A3 Q01959 1/20 0.48
TP53 P04637 1/20 0.45
ALDH1A1 P00352 5/20 0.44
MAPT P10636 2/20 0.44
MAPK1 P28482 1/20 0.44
HIF1A Q16665 1/20 0.44
POLB P06746 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.42
HSD17B10 Q99714 1/20 0.42
CES2 O00748 2/20 0.42
CES1 P23141 2/20 0.42
DAO P14920 1/20 0.42
NAPRT Q6XQN6 1/20 0.42
PKM P14618 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8778128 0.89 CES2 (0.53) LMNAF2TSHRKMT2ATDP1
SCHEMBL10938066 0.81 LMNA (0.47) LMNATSHRKMT2ATDP1SLC6A2
SCHEMBL8778253 0.81 ELANE (0.46) LMNAF2TSHRALDH1A1POLB
SCHEMBL8778267 0.81 TSHR (0.54) LMNAF2TSHRKMT2ATDP1
SCHEMBL1950214 0.79 LMNA (0.50) LMNAF2TSHRKMT2ATDP1
SCHEMBL11279529 0.79 CES2 (0.46) LMNATSHRKMT2AALDH1A1MAPT
SCHEMBL1805158 0.79 TSHR (0.52) LMNAF2TSHRKMT2ATDP1
SCHEMBL8778149 0.79 TDP1 (0.55) LMNAKMT2ATDP1ALDH1A1MAPT
SCHEMBL4956502 0.78 TSHR (0.61) LMNAF2TSHRKMT2ATDP1
SCHEMBL10936698 0.78 LMNA (0.48) LMNAF2TSHRKMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1666551-B1 Ink for ink jet-recording curable through irradiation and method for preparing lithographic printing plates using the same FUJIFILM CORP (JP) 2010-02-17 EP disclosed
US-7635181-B2 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
US-7635181-B2 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
EP-0576622-B1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 1997-11-05 EP disclosed
EP-0576622-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1994-01-05 EP disclosed
WO-1992017821-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1992-10-15 WO disclosed
US-5141839-A LITHOGRAPHIC PRINTING PLATES HAVING A RADIATION-SENSITIVE LAYER COMPRISING A PHOTOCROSSLINKABLE POLYMER, A LEUCO DYE, A PHOTOOXIDANT AND A HETEROAROMATIC AMINE N-OXIDE EASTMAN KODAK COMPANY (US) 1992-08-25 US disclosed
US-5141842-A Negative working lithography printing plates EASTMAN KODAK COMPANY (US) 1992-08-25 US disclosed
EP-0273274-A2 Degradation of polyethylene by means of agents generating free radicals Elf Atochem Deutschland GmbH (DE) 1988-07-06 EP disclosed
EP-0056674-B1 PROCESS FOR CROSS-LINKING POLYMERS AKZO N.V. (NL) 1985-05-29 EP disclosed
US-4409367-A Process for cross-linking polymers AKZONA INCORPORATED (US) 1983-10-11 US disclosed
EP-0056674-A1 Process for cross-linking polymers AKZO N.V. (NL) 1982-07-28 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed