SCHEMBL879448

SCHEMBL879448

O=C(NC(C1CCCCC1)(C1CCCCC1)C1CCCCC1)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 3/20 0.34
PTGS2 P35354 3/20 0.34
PDK1 Q15118 1/20 0.30
PDK2 Q15119 1/20 0.30
PDK3 Q15120 1/20 0.30
PDK4 Q16654 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10272627 0.81 ALDH1A1 (0.36) PDK1PDK2PDK3PDK4
SCHEMBL10284316 0.78 PDK1 (0.49) PTGS1PTGS2PDK1PDK2PDK3
SCHEMBL6007570 0.70 CA1 (0.42)
SCHEMBL16301147 0.66 SSTR4 (0.33)
SCHEMBL10203478 0.66 CA1 (0.34)
SCHEMBL12891778 0.66 PKM (0.36) PDK1PDK2PDK3PDK4
SCHEMBL14642479 0.65 DPP4 (0.30)
SCHEMBL15963629 0.65 EPHX2 (0.34)
SCHEMBL12465139 0.65 ALDH1A1 (0.48)
SCHEMBL10260605 0.65 CA2 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023579-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-05-05 US disclosed
US-8557499-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2013-10-15 US disclosed
US-20120237874-A1 Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition FUJIFILM CORPORATION (JP) 2012-09-20 US disclosed
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed
EP-2434343-A1 Resist composition, resist film therefrom and method of forming pattern therewith Fujifilm Corporation (JP) 2012-03-28 EP disclosed
US-20110008731-A1 ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-01-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110008731-A1 ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION RER1, XRN2, RXRA PTGS1 3315/4885PTGS2 3242/4885PDK1 4885/4885
US-20120237874-A1 Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition RER1, RXRA, XRN2 PTGS1 2866/4885PTGS2 3247/4885PDK1 4885/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.