Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28216183 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL5488757 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL20054 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL7159305 | 0.82 | CYP3A4 (0.33) | — | |
| Hydrochloric Acid SCHEMBL11622383 | 0.82 | CYP3A4 (0.33) | — | |
| Water SCHEMBL23461833 | 0.67 | — | — | |
| Water SCHEMBL23631871 | 0.67 | — | — | |
| Water SCHEMBL21986451 | 0.67 | — | — | |
| Water SCHEMBL25334174 | 0.67 | — | — | |
| Water SCHEMBL20838826 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9353433-B2 | Method of fabricating liquid for oxide thin film | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2016-05-31 | — | — | US | claimed |
| US-9123818-B2 | Compositions for solution process, electronic devices fabricated using the same, and fabrication methods thereof | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2015-09-01 | — | — | US | claimed |
| US-20140000480-A1 | METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2014-01-02 | — | — | US | claimed |
| US-8523996-B2 | Method of fabricating liquid for oxide thin film | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2013-09-03 | — | — | US | claimed |
| US-20120080678-A1 | COMPOSITIONS FOR SOLUTION PROCESS, ELECTRONIC DEVICES FABRICATED USING THE SAME, AND FABRICATION METHODS THEREOF | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2012-04-05 | — | — | US | claimed |
| US-20100251936-A1 | METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM | INDUSTRY-ACADEMIC COOPERATION FOUNDATION , (KR) | 2010-10-07 | — | — | US | claimed |
| EP-4391083-A2 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | Ricoh Company, Ltd. (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3350839-B1 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | RICOH CO LTD (JP) | 2024-06-12 | — | — | EP | disclosed |
| US-11908945-B2 | Coating liquid for forming n-type oxide semiconductor film, method for producing n-type oxide semiconductor film, and method for producing field-effect transistor | RICOH COMPANY, LTD. (JP) | 2024-02-20 | — | — | US | disclosed |
| CN-108028270-B | Coating liquid for forming n-type oxide semiconductor film, method for manufacturing n-type oxide semiconductor film, and method for manufacturing field effect transistor | 株式会社理光 | 2021-10-22 | — | — | CN | disclosed |
| US-20190051752-A1 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | RICOH COMOANY, LTD. (JP) | 2019-02-14 | — | — | US | disclosed |
| EP-3350839-A1 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | Ricoh Company, Ltd. (JP) | 2018-07-25 | — | — | EP | disclosed |
| CN-108028270-A | For forming coating fluid, n-type oxide semiconductor film manufacture method and the manufacturing method for field effect transistor of n-type oxide semiconductor film | 株式会社理光 | 2018-05-11 | — | — | CN | disclosed |
| US-9123818-B2 | Compositions for solution process, electronic devices fabricated using the same, and fabrication methods thereof | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2015-09-01 | — | — | US | disclosed |
| US-20140147684-A1 | GAS BARRIER FILM AND METHOD OF PREPARING THE SAME | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2014-05-29 | — | — | US | disclosed |
| US-20140000480-A1 | METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2014-01-02 | — | — | US | disclosed |
| US-8523996-B2 | Method of fabricating liquid for oxide thin film | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2013-09-03 | — | — | US | disclosed |
| US-20120080678-A1 | COMPOSITIONS FOR SOLUTION PROCESS, ELECTRONIC DEVICES FABRICATED USING THE SAME, AND FABRICATION METHODS THEREOF | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2012-04-05 | — | — | US | disclosed |
| US-20100251936-A1 | METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM | INDUSTRY-ACADEMIC COOPERATION FOUNDATION , (KR) | 2010-10-07 | — | — | US | disclosed |
| WO-2009054574-A1 | METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2009-04-30 | — | — | WO | disclosed |