Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2C known ✓ | P18825 | 4/20 | 0.46 |
| ▸ | HTR1A known ✓ | P08908 | 3/20 | 0.46 |
| ▸ | ADRA2A known ✓ | P08913 | 3/20 | 0.46 |
| ▸ | ADRA2B known ✓ | P18089 | 3/20 | 0.46 |
| ▸ | ADRB2 known ✓ | P07550 | 3/20 | 0.45 |
| ▸ | ADRB1 known ✓ | P08588 | 3/20 | 0.45 |
| ▸ | ADRB3 known ✓ | P13945 | 1/20 | 0.45 |
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.45 |
| ▸ | SLC6A4 known ✓ | P31645 | 1/20 | 0.45 |
| ▸ | ADRA1A known ✓ | P35348 | 1/20 | 0.45 |
| ▸ | HTR2B known ✓ | P41595 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.49 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.46 |
| ▸ | ICAM1 | P05362 | 1/20 | 0.46 |
| ▸ | SELE | P16581 | 1/20 | 0.46 |
| ▸ | VCAM1 | P19320 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | BDKRB2 | P30411 | 1/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL88415 | 0.98 | ALDH1A1 (0.50) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| SCHEMBL3744643 | 0.96 | ALDH1A1 (0.49) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| Ethylene SCHEMBL173231 | 0.96 | ALDH1A1 (0.49) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| SCHEMBL3730543 | 0.96 | ALDH1A1 (0.49) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| Formaldehyde SCHEMBL4291615 | 0.94 | ICAM1 (0.48) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| Ethylene Glycol SCHEMBL366742 | 0.90 | ALDH1A1 (0.48) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| Oxirane SCHEMBL27501323 | 0.88 | ADRB2 (0.50) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| SCHEMBL9352980 | 0.88 | HRH1 (0.47) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| Sulfuric Acid SCHEMBL1678480 | 0.87 | ICAM1 (0.47) | ALDH1A1KDM4EADRA2CHTR1AADRA2A | |
| Phosphoric Acid SCHEMBL4078188 | 0.87 | ICAM1 (0.47) | ALDH1A1KDM4EADRA2CHTR1AICAM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8176392-A | — | — | None | — | — | JP | disclosed |
| US-12013644-B2 | Method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| US-11898081-B2 | Ruthenium-etching solution, method for manufacturing ruthenium-etching solution, method for processing object to be processed, and method for manufacturing ruthenium-containing wiring | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-13 | — | — | US | disclosed |
| US-11873443-B2 | Composition and production method of same, and dispersing agent | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11807792-B2 | Semiconductor processing liquid and method for processing substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11773324-B2 | Semiconductor processing liquid and method for processing substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11686002-B2 | Method for manufacturing ruthenium wiring | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-27 | — | — | US | disclosed |
| WO-2023282287-A1 | CLEANING AGENT COMPOSITION FOR POST-CMP STEP | 株式会社日本触媒 | 2023-01-12 | — | — | WO | disclosed |
| US-11518937-B2 | Etching solution and method for manufacturing semiconductor element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-06 | — | — | US | disclosed |
| US-20220372369-A1 | SEMICONDUCTOR PROCESSING LIQUID AND METHOD FOR PROCESSING SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2022-11-24 | — | — | US | disclosed |
| WO-2020255602-A1 | POLISHING SOLUTION AND CHEMICAL-MECHANICAL POLISHING METHOD | 富士フイルム株式会社 | 2020-12-24 | — | — | WO | disclosed |
| WO-2020255581-A1 | POLISHING FLUID AND CHEMICAL MECHANICAL POLISHING METHOD | 富士フイルム株式会社 | 2020-12-24 | — | — | WO | disclosed |
| US-20200255465-A1 | LIGNIN DERIVATIVE COMPOUND AND USE THEREOF | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20200211856-A1 | ETCHING SOLUTION, AND METHOD OF PRODUCING SEMICONDUCTOR ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| EP-3674352-A1 | LIGNIN DERIVATIVE COMPOUND AND USE THEREOF | Nippon Paper Industries Co., Ltd. (JP) | 2020-07-01 | — | — | EP | disclosed |
| US-20200190672-A1 | ETCHING SOLUTION, METHOD FOR PROCESSING OBJECT TO BE PROCESSED, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| CN-107022421-B | Cleaning method and method for manufacturing semiconductor device | 富士胶片株式会社 | 2020-04-28 | — | — | CN | disclosed |
| CN-110997759-A | Lignin derivative compounds and uses thereof | 日本制纸株式会社 | 2020-04-10 | — | — | CN | disclosed |
| US-20190025702-A1 | TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| JP-H08176392-A | MODIFIED PROPYLENE POLYMER COMPOSITION AND SHEET AND MOLDING MATERIAL PRODUCED BY USING THE COMPOSITION | DAINIPPON INK & CHEM INC | 1996-07-09 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200255465-A1 | LIGNIN DERIVATIVE COMPOUND AND USE THEREOF | LSS, SELL, DDT | ADRA2C 3843/4885HTR1A 4690/4885ADRA2A 3953/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.