SCHEMBL8987443

SCHEMBL8987443

CC(C)(c1cccc(C(C)(C)c2ccc(O)c(O)c2O)c1)c1ccc(O)c(O)c1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.50
ESR2 Q92731 3/20 0.50
ALOX15 P16050 4/20 0.41
ALOX12 P18054 1/20 0.41
HDAC4 P56524 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
KLF10 Q13118 1/20 0.39
CA2 P00918 2/20 0.39
CNR1 P21554 3/20 0.37
CNR2 P34972 3/20 0.37
ALDH1A1 P00352 6/20 0.36
HSD17B10 Q99714 3/20 0.36
TDP1 Q9NUW8 3/20 0.36
HPGD P15428 2/20 0.36
RORC P51449 1/20 0.36
LMNA P02545 2/20 0.36
RECQL P46063 2/20 0.36
ADAMTS4 O75173 1/20 0.36
EGFR P00533 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7938646 0.91 ESR1 (0.46) ESR1ESR2ALOX15ALOX12HDAC4
SCHEMBL4063769 0.85 ESR1 (0.47) ESR1ESR2ALOX15ALOX12HDAC4
SCHEMBL6751257 0.84 ESR1 (0.46) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL29370295 0.81 ALDH1A1 (0.39) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL36382 0.81 ALDH1A1 (0.39) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL29375562 0.81 ESR1 (0.48) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL759916 0.81 ESR1 (0.48) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL759290 0.78 ESR1 (0.58) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL29375143 0.78 ESR1 (0.58) ESR1ESR2ALOX15ALOX12KLF10
SCHEMBL11130480 0.77 GABRA1 (0.62) ESR1ESR2ALOX15ALOX12HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0718693-A2 Photoresist compositions and components SHIPLEY COMPANY INC. (US) 1996-06-26 EP disclosed
US-5128230-A Positive working photoresist SHIPLEY COMPANY INC. (US) 1992-07-07 US disclosed
EP-0273026-A2 Solvents for Photoresist compositions SHIPLEY COMPANY INC. (US) 1988-06-29 EP disclosed