Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 7/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | AR | P10275 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | CASP1 | P29466 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL759916 | 1.00 | ESR1 (0.48) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL6751257 | 0.84 | ESR1 (0.46) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL29370295 | 0.81 | ALDH1A1 (0.39) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL36382 | 0.81 | ALDH1A1 (0.39) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL8987443 | 0.81 | ESR1 (0.50) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL675822 | 0.79 | ESR1 (0.62) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL2673681 | 0.79 | RNASEH1 (0.42) | ESR1ALOX15ALOX12CYP2C9CYP1A2 | |
| SCHEMBL759290 | 0.78 | ESR1 (0.58) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL29375143 | 0.78 | ESR1 (0.58) | ESR1ALOX15ALOX12ESR2CYP2C9 | |
| SCHEMBL2754945 | 0.78 | ESR1 (0.43) | ESR1ALOX15ALOX12ESR2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-119361563-A | Laminate and method for manufacturing electronic component | 东京应化工业株式会社 | 2025-01-24 | — | — | CN | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117106358-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-116262863-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-06-16 | — | — | CN | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-108884574-B | Coating agent for forming metal oxide film and method for producing substrate having metal oxide film | 东京应化工业株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-107179652-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2022-02-08 | — | — | CN | disclosed |