SCHEMBL9010858

SCHEMBL9010858

Cc1ccc(S(=O)(=O)C(=[N+]=[N-])C(=O)c2ccccc2Br)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.41
KMT2A Q03164 2/20 0.41
CASP3 P42574 1/20 0.39
SENP8 Q96LD8 1/20 0.39
SENP7 Q9BQF6 1/20 0.39
SENP6 Q9GZR1 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
RECQL P46063 1/20 0.38
ALDH1A1 P00352 5/20 0.37
LMNA P02545 3/20 0.37
PKM P14618 1/20 0.37
MAOB P27338 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
HPGD P15428 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
TP53 P04637 1/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA9 Q16790 2/20 0.35
NOD2 Q9HC29 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9010789 0.89 MAOB (0.37) KMT2AALDH1A1LMNAMAOBHPGD
SCHEMBL29130828 0.82 ALDH1A1 (0.36) POLBKMT2AL3MBTL1RECQLALDH1A1
SCHEMBL9011454 0.82 RAB9A (0.46) POLBKMT2AALDH1A1LMNAPKM
SCHEMBL384364 0.80 CES2 (0.51) KMT2AL3MBTL1RECQLALDH1A1LMNA
SCHEMBL9010795 0.78 CES2 (0.48) POLBKMT2ARECQLALDH1A1LMNA
SCHEMBL9010901 0.78 KMT2A (0.51) POLBKMT2AL3MBTL1RECQLALDH1A1
SCHEMBL384366 0.77 CES2 (0.51) KMT2AL3MBTL1RECQLALDH1A1LMNA
SCHEMBL9010921 0.77 ALDH1A1 (0.39) KMT2AALDH1A1HPGDTP53MAPT
SCHEMBL9010806 0.76 KMT2A (0.43) POLBKMT2ARECQLALDH1A1LMNA
SCHEMBL2863852 0.75 ALDH1A1 (0.43) POLBKMT2ARECQLALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed