SCHEMBL915481

SCHEMBL915481

O=C(c1ccc(O)cc1)c1ccc(CP(=O)(O)O)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.58
MAPT P10636 2/20 0.58
HTT P42858 2/20 0.58
ESR1 P03372 1/20 0.58
ESR2 Q92731 1/20 0.58
PKM P14618 1/20 0.58
HPGD P15428 1/20 0.58
SRD5A2 P31213 1/20 0.50
MAPK1 P28482 1/20 0.48
PGK1 P00558 4/20 0.47
PGK2 P07205 4/20 0.47
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
RAB9A P51151 1/20 0.46
CYP19A1 P11511 1/20 0.44
MPO P05164 1/20 0.44
CYP3A4 P08684 1/20 0.44
KDM5A P29375 1/20 0.44
BLM P54132 1/20 0.44
GFER P55789 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915744 0.88 PGK1 (0.57) ESR1ESR2PGK1PGK2ENPP2
SCHEMBL914666 0.85 SRD5A2 (0.58) SRD5A2PGK1PGK2
SCHEMBL9440234 0.85 ALDH1A1 (0.54) LMNAMAPTHTTHPGDSRD5A2
Benzophenone SCHEMBL16238911 0.85 ALDH1A1 (0.54) LMNAMAPTHTTHPGDSRD5A2
SCHEMBL916962 0.82 PGK1 (0.52) ESR1ESR2PGK1PGK2ENPP2
SCHEMBL914686 0.82 ESR1 (0.61) ESR1ESR2PGK1PGK2ENPP2
Butane SCHEMBL27352790 0.80 ENPP2 (0.59) LMNAESR1ESR2PGK1PGK2
SCHEMBL914720 0.80 ESR1 (0.47) LMNAMAPTHTTESR1ESR2
SCHEMBL914841 0.79 LOXL2 (0.54) MAPTHPGDMAPK1MEN1KMT2A
Butane SCHEMBL9440259 0.79 ALDH1A1 (0.51) LMNAMAPTHTTHPGDSRD5A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed