Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | HTR2A | P28223 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | SCN1A | P35498 | 1/20 | 0.45 |
| ▸ | HTR2B | P41595 | 1/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.45 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.45 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.45 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | SYK | P43405 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL501602 | 1.00 | TSHR (0.53) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL11428304 | 1.00 | TSHR (0.53) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL20280727 | 1.00 | TSHR (0.53) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL10306682 | 0.98 | TSHR (0.51) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL63614 | 0.92 | TDP1 (0.47) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL21148408 | 0.92 | ALDH1A1 (0.50) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL20332380 | 0.92 | ALDH1A1 (0.50) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL22876707 | 0.91 | ALDH1A1 (0.51) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E | |
| SCHEMBL7106263 | 0.89 | TSHR (0.61) | TSHRALDH1A1SMN1; SMN2KDM4EKEAP1 | |
| SCHEMBL20332826 | 0.89 | TDP1 (0.47) | TSHRALDH1A1SMN1; SMN2TDP1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 606 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-11914300-B2 | Manufacturing method of semiconductor chip, and kit | FUJIFILM CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20070298355-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070298355-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-6749988-B2 | PREVENTING A RESIST FILM FROM THINNING AND ALSO FOR ENHANCING THE RESOLUTION AND FOCUS MARGIN OF RESIST; HETEROCYCLIC AMINE COMPOUNDS HAVING A HYDRATING GROUP SUCH AS A HYDROXY, ETHER, ESTER, CARBONYL, CARBONATE GROUP OR LACTONE RING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-15 | — | — | US | disclosed |
| US-20020098443-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020098443-A1 | Amine compounds, resist compositions and patterning process | PARG, EHMT1, EHMT2 | TSHR 3757/4885ALDH1A1 4186/4885SMN1; SMN2 2840/4885 |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | TSHR 2374/4885ALDH1A1 2781/4885SMN1; SMN2 1655/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | TSHR 3144/4885ALDH1A1 762/4885SMN1; SMN2 1819/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.