SCHEMBL926567

SCHEMBL926567

ClCc1ccc(CC[Si](Cl)(Cl)Cl)cc1

nearest known ligand 0.37

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.37
CA1 P00915 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.32
TAAR1 Q96RJ0 1/20 0.31
GFER P55789 1/20 0.31
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6848455 0.89 CA2 (0.38) CA2L3MBTL1TAAR1GFERESR1
SCHEMBL4298278 0.86 CA1 (0.34) CA2CA1L3MBTL1TAAR1
SCHEMBL8508964 0.82 THRA (0.36) CA2CA1ESR1
SCHEMBL4848439 0.81 CA2 (0.34) CA2CA1L3MBTL1TAAR1
SCHEMBL4848522 0.81 CA2 (0.34) CA2CA1L3MBTL1TAAR1
SCHEMBL5490774 0.80 TAAR1 (0.52) L3MBTL1TAAR1
SCHEMBL11837156 0.78 CA2 (0.35) CA2CA1L3MBTL1TAAR1
SCHEMBL1579879 0.78 TRPA1 (0.40) CA2TAAR1
SCHEMBL27812323 0.78 ESR1 (0.59) CA2L3MBTL1TAAR1ESR1ESR2
SCHEMBL840528 0.78 CYP1A2 (0.50) TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118126106-A A method for separating asiaticoside-B, madecassoside and asiaticoside 中国科学院大连化学物理研究所 2024-06-04 CN disclosed
EP-2708546-B1 Halo-Functional Silane, process for its preparation, rubber composition containing same and articles manufactured therefrom MOMENTIVE PERFORMANCE MAT INC (US) 2016-01-06 EP disclosed
EP-2708546-A1 Halo-Functional Silane, process for its preparation, rubber composition containing same and articles manufactured therefrom Momentive Performance Materials Inc. (US) 2014-03-19 EP disclosed
EP-2207782-B1 HALO-FUNCTIONAL SILANE, PROCESS FOR ITS PREPARATION, RUBBER COMPOSITION CONTAINING SAME AND ARTICLES MANUFACTURED THEREFROM MOMENTIVE PERFORMANCE MAT INC (US) 2014-02-26 EP disclosed
US-8372906-B2 Halo-functional silane, process for its preparation, rubber composition containing same and articles manufactured therefrom MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2013-02-12 US disclosed
EP-2471899-A1 TEMPERATURE-RESPONSIVE CELL CULTURE SUBSTRATE ON WHICH A STRAIGHT-CHAIN TEMPERATURE-RESPONSIVE POLYMER IS IMMOBILIZED, AND MANUFACTURING METHOD THEREFOR Tokyo Women's Medical University (JP) 2012-07-04 EP disclosed
US-20120156781-A1 TEMPERATURE-RESPONSIVE CELL CULTURE SUBSTRATE ON WHICH A STRAIGHT-CHAIN TEMPERATURE-RESPONSIVE POLYMER IS IMMOBILIZED, AND MANUFACTURING METHOD THEREFOR TOKYO WOMEN'S MEDICAL UNIVERSITY (JP) 2012-06-21 US disclosed
US-20110136264-A1 METHOD FOR DETECTING TARGET SUBSTANCE AND TARGET-SUBSTANCE DETECTION KIT CANON KABUSHIKI KAISHA (JP) 2011-06-09 US disclosed
US-7932100-B2 Method for detecting target substance and target-substance detection kit CANON KABUSHIKI KAISHA (JP) 2011-04-26 US disclosed
EP-2310446-A1 ACTIVATED HALO-CONTAINING ARALKYLSILANE Momentive Performance Materials Inc. (US) 2011-04-20 EP disclosed
US-7678862-B2 Electrophoretic particles and production process thereof CANON KABUSHIKI KAISHA (JP) 2010-03-16 US disclosed
WO-2010017370-A1 ACTIVATED HALO-CONTAINING ARALKYLSILANE MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2010-02-11 WO disclosed
WO-2009058373-A2 HALO-FUNCTIONAL SILANE, PROCESS FOR ITS PREPARATION, RUBBER COMPOSITION CONTAINING SAME AND ARTICLES MANUFACTURED THEREFROM MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2009-05-07 WO disclosed
US-20090111923-A1 Halo-functional silane, process for its preparation, rubber composition containing same and articles manufactured therefrom MOMENTIVE PERFORMANCE MATERIALS INC. 2009-04-30 US disclosed
US-20090000360-A1 Method for Detecting Target Substance and Target-Substance Detection Kit CANON KABUSHIKI KAISHA (JP) 2009-01-01 US disclosed
US-7463400-B1 Electrochromic display device FUJI XEROX CO., LTD. (JP) 2008-12-09 US disclosed
US-6284365-B1 FOR CONTROLLING PHYSICAL PROPERTIES OF SURFACE AND INTERFACE OF SOLID ARTICLE SUCH AS WETTABILITY, ADHESIVE PROPERTY, SURFACE ENERGY, DISPERSABILITY, CHEMICAL RESISTANCE FUJI XEROX CO., LTD. (JP) 2001-09-04 US disclosed
EP-0315954-B1 Pattern-forming material and pattern formation method TORAY SILICONE CO (JP) 1995-11-22 EP disclosed
US-4985342-A Semiconductors, Integrated Circuits TORAY SILICONE COMPANY, LTD. (JP) 1991-01-15 US disclosed
EP-0315954-A2 Pattern-forming material and pattern formation method TORAY SILICONE COMPANY, LIMITED (JP) 1989-05-17 EP disclosed