SCHEMBL9547610

SCHEMBL9547610

CNC(=O)NCCCCCCNC(=O)NC

nearest known ligand 0.61

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 8/20 0.61
KEAP1 Q14145 1/20 0.59
NFE2L2 Q16236 1/20 0.59
KDM4E B2RXH2 1/20 0.55
MAPK1 P28482 1/20 0.55
HIF1A Q16665 1/20 0.55
PRMT1 Q99873 1/20 0.52
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
ALDH1A1 P00352 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
PAOX Q6QHF9 2/20 0.44
CASP2 P42575 1/20 0.43
ADRA1A P35348 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19171946 1.00 EPHX1 (0.61) EPHX1KEAP1NFE2L2KDM4EMAPK1
SCHEMBL13466509 0.97 KEAP1 (0.61) EPHX1KEAP1NFE2L2KDM4EMAPK1
SCHEMBL6289749 0.93 EPHX1 (0.54) EPHX1KEAP1NFE2L2KDM4EMAPK1
SCHEMBL19171419 0.92 EPHX1 (0.58) EPHX1KEAP1NFE2L2KDM4EMAPK1
SCHEMBL11382117 0.92 KEAP1 (0.55) EPHX1KEAP1NFE2L2KDM4EMAPK1
SCHEMBL25228539 0.91 EPHX1 (0.78) EPHX1CASP2
SCHEMBL25277323 0.91 EPHX1 (0.78) EPHX1CASP2
SCHEMBL8395449 0.91 EPHX1 (0.78) EPHX1CASP2
SCHEMBL24285430 0.91 EPHX1 (0.78) EPHX1CASP2
SCHEMBL8397082 0.91 EPHX1 (0.78) EPHX1CASP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3157978-B1 STRICTLY SEGMENTED THERMOPLASTIC ELASTOMERS AS BIODEGRADABLE BIOMATERIALS SYMO CHEM B V (NL) 2021-08-11 EP disclosed
US-20170210736-A1 PHENYL TETRAHYDROISOQUINOLINE COMPOUND SUBSTITUTED WITH HETEROARYL TAISHO PHARMACEUTICAL CO., LTD (JP) 2017-07-27 US disclosed
US-9202709-B2 Polishing liquid for metal and polishing method using the same FUJIFILM CORPORATION (JP) 2015-12-01 US disclosed
US-20100075500-A1 Metal polishing slurry and chemical mechanical polishing method FUJIFILM CORPORATION (JP) 2010-03-25 US disclosed
US-20090239380-A1 POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-09-24 US disclosed
US-20090088361-A1 CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-7261999-B2 Photothermographic materials containing post-processing stabilizers CARESTREAM HEALTH, INC. (US) 2007-08-28 US disclosed
US-7261999-B2 Photothermographic materials containing post-processing stabilizers CARESTREAM HEALTH, INC. (US) 2007-08-28 US disclosed
US-20070117053-A1 Photothermographic materials containing post-processing stabilizers EASTMAN KODAK COMPANY 2007-05-24 US disclosed
US-20070117053-A1 Photothermographic materials containing post-processing stabilizers EASTMAN KODAK COMPANY 2007-05-24 US disclosed
US-5194660-A Processes for producing carbamates and isocyanates UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-03-16 US disclosed
US-4621149-A PLATINUM GROUP METAL HALOGEN OR HALOGEN COMPOUND ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1986-11-04 US disclosed
EP-0083096-A2 Production of urethane compounds Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1983-07-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090088361-A1 CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME AOC1, SPIN1, USP1 EPHX1 913/4885KEAP1 2229/4885NFE2L2 2908/4885
US-20170210736-A1 PHENYL TETRAHYDROISOQUINOLINE COMPOUND SUBSTITUTED WITH HETEROARYL NHERF1, SLC9A3, SLC26A3 EPHX1 1422/4885KEAP1 1087/4885NFE2L2 1616/4885
US-20100075500-A1 Metal polishing slurry and chemical mechanical polishing method NOX1, NOXO1, PIEZO1 EPHX1 3670/4885KEAP1 2929/4885NFE2L2 1812/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.