Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 4/20 | 0.57 |
| ▸ | CES1 | P23141 | 4/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.57 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | ACP3 | P15309 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.41 |
| ▸ | PGR | P06401 | 1/20 | 0.41 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.41 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | HRH1 | P35367 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28256435 | 0.85 | ALDH1A1 (0.50) | CES2CES1LMNAALDH1A1KDM4E | |
| SCHEMBL10405150 | 0.84 | LMNA (0.45) | CES2CES1LMNAALDH1A1KDM4E | |
| SCHEMBL9055063 | 0.82 | CES2 (0.50) | CES2CES1LMNAALDH1A1KDM4E | |
| SCHEMBL8150583 | 0.82 | CES2 (0.50) | CES2CES1LMNAALDH1A1KDM4E | |
| SCHEMBL168463 | 0.82 | LMNA (0.52) | CES2CES1LMNAALDH1A1L3MBTL1 | |
| SCHEMBL168464 | 0.82 | LMNA (0.52) | CES2CES1LMNAALDH1A1L3MBTL1 | |
| SCHEMBL538051 | 0.82 | LMNA (0.52) | CES2CES1LMNAALDH1A1L3MBTL1 | |
| SCHEMBL6518870 | 0.81 | PGR (0.49) | CES2CES1LMNAHSP90AA1ATM | |
| SCHEMBL29579913 | 0.81 | PGR (0.49) | CES2CES1LMNAHSP90AA1ATM | |
| SCHEMBL29616382 | 0.81 | CES2 (0.53) | CES2CES1ACP3HPGDESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| WO-2026100734-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100079-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12601970-B2 | Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20250341777-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND SEMICONDUCTOR ELEMENT | RESONAC CORP (JP) | 2025-11-06 | — | — | US | disclosed |
| US-20250271757-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND SEMICONDUCTOR ELEMENT | RESONAC CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| WO-2025099883-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, PATTERNED CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2025-05-15 | — | — | WO | disclosed |
| WO-2025095080-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PATTERN PRODUCT, AND CURED PRODUCT | 株式会社レゾナック | 2025-05-08 | — | — | WO | disclosed |
| WO-2025088705-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2025-05-01 | — | — | WO | disclosed |
| WO-2025088815-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERNED CURED PRODUCT, PRODUCTION METHOD FOR PATTERNED CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2025-05-01 | — | — | WO | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |
| US-4912122-A | Triazolyl alkanones or triazolyl-alkanols | BAYER AKTIENGESELLSCHAFT (DE) | 1990-03-27 | — | — | US | disclosed |
| US-4908283-A | Curing acryloyl-denatured polyalkylene oxide and inorganic ion salt by irradiating with active rays | UBE INDUSTRIES, LTD. (JP) | 1990-03-13 | — | — | US | disclosed |
| US-4776877-A | FUNGICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1988-10-11 | — | — | US | disclosed |
| US-4772623-A | FUNGICIDES, MICROBIOCIDES, PLANT GROWTH REGULATORS | BAYER AKTIENGESELLSCHAFT (DE) | 1988-09-20 | — | — | US | disclosed |
| EP-0257863-A1 | Plastic cladding composition for silica or glass core optical fiber, and silica or glass core optical fiber prepared therefrom | MITSUBISHI RAYON CO., LTD. (JP) | 1988-03-02 | — | — | EP | disclosed |
| EP-0256765-A1 | Plastic cladding composition for plastic core optical fiber, and plastic core optical fiber prepared therefrom | MITSUBISHI RAYON CO., LTD. (JP) | 1988-02-24 | — | — | EP | disclosed |
| US-4582843-A | FUNGICIDES, MICROBIOCIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1986-04-15 | — | — | US | disclosed |
| US-4337348-A | SENSITIZERS FOR PHOTOCURING POLYSILOXANES | SHIN-ETSU CHEMICAL COMPANY LIMITED (JP) | 1982-06-29 | — | — | US | disclosed |
| US-3968309-A | Molded articles of plastics having improved surface characteristics and process for producing the same | DAINIPPON PRINTING CO., LTD. (JA) | 1976-07-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12601970-B2 | Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component | ARCN1, P4HA1, COL1A1 | CES2 309/4885CES1 854/4885LMNA 1465/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.