SCHEMBL9608686

SCHEMBL9608686

COc1ccc(CCCOC(=O)C(C)C)cc1

nearest known ligand 0.53

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 1/20 0.53
ALOX5 P09917 1/20 0.53
ALDH1A1 P00352 2/20 0.51
F2RL1 P55085 1/20 0.50
KMT2A Q03164 1/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
NPC1 O15118 1/20 0.49
MAPT P10636 1/20 0.49
RAB9A P51151 1/20 0.49
POLB P06746 1/20 0.48
IGF1R P08069 1/20 0.47
ALOX15 P16050 1/20 0.47
LDHA P00338 1/20 0.47
NAAA Q02083 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29034757 0.83 CALM1 (0.56) CALM1ALOX5F2RL1KMT2ASMN1; SMN2
SCHEMBL24334171 0.82 RAB9A (0.47) ALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL873707 0.81 LMNA (0.64) ALDH1A1KMT2ASMN1; SMN2NPC1MAPT
SCHEMBL4456075 0.80 ALDH1A1 (0.55) ALDH1A1F2RL1SMN1; SMN2NPC1MAPT
SCHEMBL15994131 0.79 ELANE (0.46) ALDH1A1F2RL1SMN1; SMN2NPC1MAPT
SCHEMBL15809483 0.79 CALM1 (0.54) CALM1ALOX5F2RL1SMN1; SMN2NPC1
SCHEMBL10165844 0.79 ALOX5 (0.62) CALM1ALOX5ALDH1A1F2RL1KMT2A
SCHEMBL28028229 0.78 POLB (0.52) CALM1ALOX5F2RL1SMN1; SMN2NPC1
SCHEMBL28013657 0.78 THRB (0.56) CALM1ALOX5ALDH1A1F2RL1SMN1; SMN2
SCHEMBL28132820 0.77 LDHA (0.47) CALM1ALOX5ALDH1A1F2RL1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120135348-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-05-31 US disclosed
US-20120135348-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-05-31 US disclosed