Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14727856 | 0.92 | HSD11B1 (0.36) | HSD11B1CA2MEN1ALDH1A1KMT2A | |
| SCHEMBL19601055 | 0.89 | HSD11B1 (0.35) | HSD11B1CA2MEN1ALDH1A1KMT2A | |
| SCHEMBL9612245 | 0.89 | CA2 (0.36) | HSD11B1CA2MEN1ALDH1A1KMT2A | |
| SCHEMBL9610771 | 0.89 | HSD11B1 (0.33) | HSD11B1MEN1ALDH1A1KMT2AATM | |
| SCHEMBL9610792 | 0.87 | HSD11B1 (0.33) | HSD11B1MEN1ALDH1A1KMT2AATM | |
| SCHEMBL19601052 | 0.84 | ALDH1A1 (0.38) | HSD11B1CA2MEN1ALDH1A1KMT2A | |
| SCHEMBL9610794 | 0.83 | CA2 (0.32) | CA2 | |
| SCHEMBL9610806 | 0.82 | CA2 (0.40) | CA2MEN1ALDH1A1KMT2AATM | |
| SCHEMBL16807913 | 0.81 | HSD11B1 (0.36) | HSD11B1 | |
| SCHEMBL9610781 | 0.80 | NPSR1 (0.34) | CA2MEN1ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802352-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8741544-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8420294-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-16 | — | — | US | disclosed |
| US-20130052588-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130040239-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-14 | — | — | US | disclosed |
| US-20120135351-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120135351-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | C1R, AFF1, C1S | HSD11B1 367/4885CA2 122/4885MEN1 825/4885 |
| US-20130040239-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | CRY1, H1-0, SPIN1 | HSD11B1 1317/4885CA2 891/4885MEN1 917/4885 |
| US-20130052588-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | RER1, COL1A1, H1-0 | HSD11B1 2714/4885CA2 508/4885MEN1 3252/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.