SCHEMBL19601052

SCHEMBL19601052

C=C(C)C(=O)OC1C2CC3CC1CC(C(=O)OCC1COC(C)(C)O1)(C3)C2

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
CA2 P00918 1/20 0.35
HSD11B1 P28845 1/20 0.32
PRKCA P17252 1/20 0.32
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
ATM Q13315 1/20 0.31
MAPT P10636 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14727856 0.85 HSD11B1 (0.36) ALDH1A1CA2HSD11B1MEN1KMT2A
SCHEMBL9610780 0.84 HSD11B1 (0.35) ALDH1A1CA2HSD11B1MEN1KMT2A
SCHEMBL9610806 0.83 CA2 (0.40) ALDH1A1CA2PRKCAMEN1KMT2A
SCHEMBL19601055 0.83 HSD11B1 (0.35) ALDH1A1CA2HSD11B1MEN1KMT2A
SCHEMBL22349346 0.82 HSD11B1 (0.37) ALDH1A1HSD11B1
SCHEMBL9612245 0.81 CA2 (0.36) ALDH1A1CA2HSD11B1MEN1KMT2A
SCHEMBL9610804 0.76 CA2 (0.39) ALDH1A1CA2PRKCAMEN1KMT2A
SCHEMBL13963895 0.76 PRKCA (0.38) ALDH1A1HSD11B1PRKCAMEN1KMT2A
SCHEMBL12892479 0.75 HSD11B1 (0.39) HSD11B1
SCHEMBL14470792 0.75 ALDH1A1 (0.65) ALDH1A1CA2NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-02 US disclosed
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-02 US disclosed
US-20200326625-A1 COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-10-15 US disclosed
US-10747111-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-08-18 US disclosed
US-20170329223-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed
US-20170329223-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200326625-A1 COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN HAX1, BRIX1, RXRA ALDH1A1 2800/4885CA2 4741/4885HSD11B1 3373/4885
US-10747111-B2 Compound, resin, photoresist composition and process for producing photoresist pattern HAX1, BRIX1, RXRA ALDH1A1 2800/4885CA2 4741/4885HSD11B1 3373/4885
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern HAX1, BRIX1, RXRA ALDH1A1 2800/4885CA2 4741/4885HSD11B1 3373/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.