Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 5/20 | 0.34 |
| ▸ | PKM | P14618 | 4/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.34 |
| ▸ | HTT | P42858 | 3/20 | 0.34 |
| ▸ | STAT3 | P40763 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | KCNMA1 | Q12791 | 3/20 | 0.33 |
| ▸ | RAB9A | P51151 | 4/20 | 0.32 |
| ▸ | NPC1 | O15118 | 3/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | GFER | P55789 | 1/20 | 0.31 |
| ▸ | PIM1 | P11309 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10872647 | 0.99 | LMNA (0.34) | LMNAPKMSMN1; SMN2HTTSTAT3 | |
| Iodide SCHEMBL9627645 | 0.73 | KCNMA1 (0.45) | SMN1; SMN2KCNMA1RAB9ANPC1GAA | |
| SCHEMBL10872651 | 0.72 | KCNMA1 (0.46) | SMN1; SMN2KCNMA1RAB9ANPC1GAA | |
| SCHEMBL8645601 | 0.62 | KCNMA1 (0.67) | LMNASMN1; SMN2NPSR1KCNMA1RAB9A | |
| Iodide SCHEMBL9627651 | 0.59 | BCHE (0.30) | — | |
| SCHEMBL890612 | 0.59 | KCNMA1 (0.67) | LMNAPKMSMN1; SMN2KCNMA1RAB9A | |
| SCHEMBL29845601 | 0.59 | KCNMA1 (0.67) | LMNAPKMSMN1; SMN2KCNMA1RAB9A | |
| SCHEMBL29839046 | 0.59 | KCNMA1 (0.69) | LMNASMN1; SMN2KCNMA1RAB9ANPC1 | |
| SCHEMBL8040200 | 0.59 | SLC9A1 (0.48) | NPSR1KCNMA1RAB9ANPC1GAA | |
| SCHEMBL3413666 | 0.58 | TDP1 (0.47) | LMNASMN1; SMN2HTTKCNMA1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0188236-B1 | POLYACETAL RESIN COMPOSITIONS HAVING IMPROVED RESISTANCE TO DETERIORATION WHEN EXPOSED TO LIGHT AND CONTAINING ALKYLIDENE BIS(BENZOTRIAZOLYL PHENOLS) | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1992-04-01 | — | — | EP | disclosed |
| EP-0180993-B1 | PROCESS FOR PREPARING 2,2'-METHYLENE-BIS-(4-HYDROCARBYL-6-BENZO-TRIAZOLYLPHENOLS) | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1991-02-27 | — | — | EP | disclosed |
| EP-0180992-B1 | STABILIZER COMPOSITIONS FOR SYNTHETIC RESINS IMPARTING IMPROVED LIGHT STABILITY | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1990-07-11 | — | — | EP | disclosed |
| US-4937348-A | Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzotriazolylphenols) | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1990-06-26 | — | — | US | disclosed |
| US-4871793-A | Polyphenylene sulfide resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis (benzotriazolylphenols) | NAKAHARA YUTAKA (JP) | 1989-10-03 | — | — | US | disclosed |
| US-4812498-A | Polycarbonate resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols) | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1989-03-14 | — | — | US | disclosed |
| US-4684679-A | DISCOLORATION INHIBITION | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1987-08-04 | — | — | US | disclosed |
| US-4684680-A | BENZOTRIAZOLYL PHENOL STABILIZER | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1987-08-04 | — | — | US | disclosed |
| US-4681905-A | 2,2,6,6-TETRAMETHYLPIPERIDYL COMPOUND, AND AN ALKYLIDENE-BIS-(BENZOTRIAZOLYL PHENYL) | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1987-07-21 | — | — | US | disclosed |
| EP-0188236-A2 | Polyacetal resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols) | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1986-07-23 | — | — | EP | disclosed |
| EP-0180991-A2 | Thermosetting synthetic resin lacquer compositions having improved light stability | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1986-05-14 | — | — | EP | disclosed |
| EP-0180993-A2 | Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzo-triazolylphenols) | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1986-05-14 | — | — | EP | disclosed |