Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.37 |
| ▸ | ADRA2C | P18825 | 2/20 | 0.37 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.37 |
| ▸ | LTB4R | Q15722 | 2/20 | 0.36 |
| ▸ | LTB4R2 | Q9NPC1 | 2/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | NOS2 | P35228 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13195347 | 1.00 | HCAR2 (0.47) | HCAR2KMT2ACYP2D6FFAR1ADRA2A | |
| SCHEMBL11923788 | 1.00 | HCAR2 (0.47) | HCAR2KMT2ACYP2D6FFAR1ADRA2A | |
| SCHEMBL4671829 | 0.80 | CYP2A6 (0.39) | KMT2AALOX5LMNA | |
| SCHEMBL4916209 | 0.79 | HCAR2 (0.44) | HCAR2CYP2D6FFAR1ADRA2AADRA2C | |
| SCHEMBL14463081 | 0.78 | TYR (0.39) | KMT2AHIF1AKDM4E | |
| SCHEMBL14628340 | 0.78 | ADRB2 (0.45) | LMNAHIF1A | |
| SCHEMBL26558297 | 0.78 | KMT2A (0.39) | HCAR2KMT2ACYP2D6ADRA2AADRA2C | |
| SCHEMBL17460779 | 0.78 | AOC3 (0.41) | LMNA | |
| SCHEMBL19850868 | 0.78 | HCAR2 (0.38) | HCAR2KMT2ACYP2D6FFAR1ADRA2A | |
| SCHEMBL8105843 | 0.77 | HCAR2 (0.43) | HCAR2CYP2D6FFAR1ADRA2AADRA2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1776 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | claimed |
| US-20260050214-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-19 | — | — | US | claimed |
| US-12535733-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | claimed |
| US-12189292-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-07 | — | — | US | claimed |
| US-20240345480-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-10-17 | — | — | US | claimed |
| US-20240329529-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-10-03 | — | — | US | claimed |
| US-11994799-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-28 | — | — | US | claimed |
| US-20240116958-A1 | Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist Material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | claimed |
| EP-4339702-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, PATTERNING PROCESS, AND SEMICONDUCTOR PHOTORESIST MATERIAL | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-20 | — | — | EP | claimed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | claimed |
| US-5198144-A | Perfume | KAO CORPORATION (JP) | 1993-03-30 | — | — | US | claimed |
| EP-0339276-B1 | BATHING PREPARATION | Kao Corporation (JP) | 1992-06-03 | — | — | EP | claimed |
| EP-0339276-A2 | Bathing preparation | Kao Corporation (JP) | 1989-11-02 | — | — | EP | claimed |
| EP-0091794-B1 | PROCESS FOR PREPARING 1.6-DISUBSTITUTED 2-AMINOBENZIMIDAZOLES | ELI LILLY AND COMPANY (US) | 1988-11-30 | — | — | EP | claimed |
| US-4701336-A | MIXTURE OF DIETHYL SUCCINATE, PHENETHYL FORMATE AND PHENETHYL ALCOHOL | NABISCO BRANDS, INC. (US) | 1987-10-20 | — | — | US | claimed |
| US-4434288-A | Preparation of substituted 1-thiazinyl or 1-thiazolyl-2-aminobenzimidazoles | ELI LILLY AND COMPANY (US) | 1984-02-28 | — | — | US | claimed |
| EP-0091794-A1 | Process for preparing 1.6-disubstituted 2-aminobenzimidazoles | ELI LILLY AND COMPANY (US) | 1983-10-19 | — | — | EP | claimed |
| US-4196125-A | VIRICIDES | ELI LILLY AND COMPANY (US) | 1980-04-01 | — | — | US | claimed |
| US-4118573-A | ANTIVIRAL AGENTS | ELI LILLY AND COMPANY (US) | 1978-10-03 | — | — | US | claimed |
| US-4018790-A | VIRICIDES | ELI LILLY AND COMPANY (US) | 1977-04-19 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | LBR, LIFR, LEF1 | HCAR2 304/4885KMT2A 2894/4885CYP2D6 2065/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | HCAR2 2296/4885KMT2A 2745/4885CYP2D6 3075/4885 |
| US-12535733-B2 | Molecular resist composition and patterning process | ETV6, AR, ETV1 | HCAR2 2925/4885KMT2A 1980/4885CYP2D6 3193/4885 |
| US-20260050214-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | NR3C2, IGF1R, AGTR1 | HCAR2 1575/4885KMT2A 2380/4885CYP2D6 3291/4885 |
| US-20240116958-A1 | Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist Material | FEM1B, ASH2L, MSI2 | HCAR2 4762/4885KMT2A 185/4885CYP2D6 4103/4885 |
| US-11994799-B2 | Negative resist composition and pattern forming process | GABRE, ZW10, VIM | HCAR2 2549/4885KMT2A 2259/4885CYP2D6 3091/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.