Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | FAAH | O00519 | 1/20 | 0.35 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.35 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.35 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | SNCA | P37840 | 1/20 | 0.33 |
| ▸ | SRC | P12931 | 1/20 | 0.32 |
| ▸ | HTR6 | P50406 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 4/20 | 0.31 |
| ▸ | CA12 | O43570 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8972780 | 1.00 | TSHR (0.39) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| SCHEMBL11393462 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Sulfuric Acid SCHEMBL1062108 | 0.89 | TSHR (0.44) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Sulfuric Acid SCHEMBL1777697 | 0.84 | HTR6 (0.39) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Sulfuric Acid SCHEMBL1780831 | 0.84 | KDM4E (0.50) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| SCHEMBL1628635 | 0.79 | KEAP1 (0.39) | HTR6MMP2CA2CA12CA9 | |
| SCHEMBL1718014 | 0.79 | KEAP1 (0.44) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Anthraquinone SCHEMBL1405498 | 0.79 | KMT2A (0.48) | SMN1; SMN2KDM4EMAPTPOLBALDH1A1 | |
| Toliodium SCHEMBL8327648 | 0.79 | TLR9 (0.42) | SMN1; SMN2PRSS1PRSS2PRSS3POLB | |
| Trifluoromethanesulfonic Acid SCHEMBL30407359 | 0.79 | GPR3 (0.43) | TSHRSMN1; SMN2KDM4EMAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5981146-A | CONTAINING A COMPOUND HAVING A SULFONIC ACID GROUP OR A CARBONIC ACID GROUP IS FORMED ON A CHEMICAL-AMPLIFICATION-TYPE RESIST FILM OF A SEMICONDUCTTOR SUBSTRATE, FOLLOWED BY PERFORMING EXPOSURE | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1999-11-09 | — | — | US | claimed |
| CN-118253469-A | Laminate and method for producing same | 株式会社东进世美肯 | 2024-06-28 | — | — | CN | disclosed |
| CN-112708046-B | Ether super-early-strength polycarboxylate superplasticizer and preparation method thereof | 科之杰新材料集团有限公司 | 2022-10-28 | — | — | CN | disclosed |
| US-7871751-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080153031-A1 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-06-26 | — | — | US | disclosed |
| US-20040191672-A1 | Resist composition | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| EP-1443362-A2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-5981146-A | CONTAINING A COMPOUND HAVING A SULFONIC ACID GROUP OR A CARBONIC ACID GROUP IS FORMED ON A CHEMICAL-AMPLIFICATION-TYPE RESIST FILM OF A SEMICONDUCTTOR SUBSTRATE, FOLLOWED BY PERFORMING EXPOSURE | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1999-11-09 | — | — | US | disclosed |
| US-5565304-A | ALKALI SOLUBLE BINDER RESIN FROM HYDROXYSTYRENEAND METHYLOLATED PHENOLIC COMPOUND | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-10-15 | — | — | US | disclosed |
| US-5550004-A | RESIN BINDER HAVING HYDROXYSTYRENE AND MONOMETHYLOLATED PHENOLIC COMPOUNDS | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-08-27 | — | — | US | disclosed |
| EP-0727711-A2 | Photoresist compositions containing supercritical fluid fractionated polymeric binder resins | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-08-21 | — | — | EP | disclosed |
| EP-0697632-A2 | Chemically amplified radiation-sensitive composition | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-02-21 | — | — | EP | disclosed |