Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 | Q14145 | 1/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 7/20 | 0.39 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | CA9 | Q16790 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | HTR6 | P50406 | 1/20 | 0.36 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.34 |
| ▸ | MMP2 | P08253 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL1777697 | 0.90 | HTR6 (0.39) | CA12CA2CA9L3MBTL1HTR6 | |
| SCHEMBL4452953 | 0.86 | PSIP1 (0.43) | CA12CA2CA9L3MBTL1PSIP1 | |
| SCHEMBL11393462 | 0.85 | FAAH (0.39) | CA12CA2CA9L3MBTL1HTR6 | |
| Sulfuric Acid SCHEMBL1062108 | 0.85 | TSHR (0.44) | CA12CA2CA9HTR6MMP2 | |
| SCHEMBL1718014 | 0.85 | KEAP1 (0.44) | KEAP1CA12CA2MMP2NPSR1 | |
| SCHEMBL7574610 | 0.84 | ALDH1A1 (0.47) | KEAP1PTGS2L3MBTL1 | |
| SCHEMBL454457 | 0.81 | HTR6 (0.44) | KEAP1CA12CA2CA9L3MBTL1 | |
| SCHEMBL978653 | 0.79 | TSHR (0.39) | CA12CA2CA9HTR6MMP2 | |
| Trifluoromethanesulfonic Acid SCHEMBL36177 | 0.79 | GPR3 (0.50) | CA2CA9ACHE | |
| Anthraquinone SCHEMBL1405500 | 0.79 | MEN1 (0.52) | NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111484529-A | Method for synthesizing tenofovir monophenyl ester | 奥锐特药业股份有限公司 | 2020-08-04 | — | — | CN | claimed |
| US-6566036-B2 | Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization | NEC ELECTRONICS CORPORATION (JP) | 2003-05-20 | — | — | US | claimed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | claimed |
| US-6200480-B1 | CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES | ARCH SPECIALTY CHEMICALS, INC. | 2001-03-13 | — | — | US | claimed |
| EP-1054715-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | Olin Microelectronic Chemicals, Inc. (US) | 2000-11-29 | — | — | EP | claimed |
| WO-1999036151-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-07-22 | — | — | WO | claimed |
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20250256980-A1 | METAL OXIDE PARTICLE HAVING CORE-SHELL STRUCTURE AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12359039-B2 | Metal oxide particle-containing composition with reduced occurrence of volatile aldehydes | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-15 | — | — | US | disclosed |
| WO-2025127152-A1 | METAL OXIDE PARTICLES HAVING IMPROVED HYDROPHOBICITY, HIGHLY CONCENTRATED METAL OXIDE SOL, AND METHODS FOR PRODUCING SAME | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| CN-119894824-A | Hollow silica sol containing 1-valent alkali metal ion and method for producing same | 日产化学株式会社 | 2025-04-25 | — | — | CN | disclosed |
| WO-2025084429-A1 | SILICA PARTICLES FOR COATING COMPOSITION AND LAMINATED SUBSTRATE | 日産化学株式会社 | 2025-04-24 | — | — | WO | disclosed |
| EP-1193553-A2 | Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | disclosed |
| US-6200480-B1 | CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES | ARCH SPECIALTY CHEMICALS, INC. | 2001-03-13 | — | — | US | disclosed |
| EP-1054715-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | Olin Microelectronic Chemicals, Inc. (US) | 2000-11-29 | — | — | EP | disclosed |
| US-6080833-A | BIS(HYDROXYALKOXYLATED) 1,1'-SPIROBIINDAN POLYCARBONATES AND POLYESTERS POLYMERS AND CURABLE COMPOUNDS SUCH AS BIS(ACRYLATED ALKOXY)SPIROBIINDANS; ALSO POLYAMIDES AND POLYIMIDES CONTAINING SPIROBIINDAN GROUPS | MITSUI CHEMICALS, INC. (JP) | 2000-06-27 | — | — | US | disclosed |
| WO-1999036151-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-07-22 | — | — | WO | disclosed |
| EP-0822545-A2 | Optical component and spirobiindan polymer therefor | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1998-02-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | CD63, SLC39A3, ZRANB2 | KEAP1 4149/4885PTGS2 3709/4885CA12 988/4885 |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | SCO2, SOD1, SPOP | KEAP1 4768/4885PTGS2 3940/4885CA12 889/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.