Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.37 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 3/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
| ▸ | MMP8 | P22894 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | PMP22 | Q01453 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | GMNN | O75496 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL1780831 | 0.90 | KDM4E (0.50) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Sulfuric Acid SCHEMBL1062108 | 0.85 | TSHR (0.44) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| SCHEMBL1628635 | 0.85 | KEAP1 (0.39) | KEAP1CA2MMP2NPSR1CA12 | |
| SCHEMBL978653 | 0.79 | TSHR (0.39) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Trifluoromethanesulfonic Acid SCHEMBL758916 | 0.79 | PTPN1 (0.41) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Anthraquinone SCHEMBL1405501 | 0.79 | MEN1 (0.52) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| SCHEMBL8972780 | 0.79 | TSHR (0.39) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| Sulfuric Acid SCHEMBL1777697 | 0.79 | HTR6 (0.39) | TSHRSMN1; SMN2KDM4EMAPTHPGD | |
| SCHEMBL7164635 | 0.78 | MYC (0.43) | TSHRSMN1; SMN2KDM4ECA2CA1 | |
| SCHEMBL36560 | 0.78 | ALDH1A1 (0.40) | TSHRCA2CA1LMNAPMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6566036-B2 | Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization | NEC ELECTRONICS CORPORATION (JP) | 2003-05-20 | — | — | US | claimed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | claimed |
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20250256980-A1 | METAL OXIDE PARTICLE HAVING CORE-SHELL STRUCTURE AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12359039-B2 | Metal oxide particle-containing composition with reduced occurrence of volatile aldehydes | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-15 | — | — | US | disclosed |
| WO-2025127152-A1 | METAL OXIDE PARTICLES HAVING IMPROVED HYDROPHOBICITY, HIGHLY CONCENTRATED METAL OXIDE SOL, AND METHODS FOR PRODUCING SAME | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| CN-119894824-A | Hollow silica sol containing 1-valent alkali metal ion and method for producing same | 日产化学株式会社 | 2025-04-25 | — | — | CN | disclosed |
| WO-2025084429-A1 | SILICA PARTICLES FOR COATING COMPOSITION AND LAMINATED SUBSTRATE | 日産化学株式会社 | 2025-04-24 | — | — | WO | disclosed |
| EP-4541769-A1 | METAL OXIDE PARTICLE HAVING CORE-SHELL STRUCTURE AND METHOD FOR PRODUCING SAME | Nissan Chemical Corporation (JP) | 2025-04-23 | — | — | EP | disclosed |
| WO-2025069657-A1 | METAL OXIDE PARTICLES WITH COATING AND VARNISH USING SAME | 日産化学株式会社 | 2025-04-03 | — | — | WO | disclosed |
| US-7517619-B2 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20080311492-A1 | INKLESS REIMAGEABLE PRINTING PAPER AND METHOD | XEROX CORPORATION (US) | 2008-12-18 | — | — | US | disclosed |
| EP-2003501-A1 | Inkless reimageable printing paper and method | Xerox Corporation (US) | 2008-12-17 | — | — | EP | disclosed |
| US-20070020559-A1 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20060172206-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-08-03 | — | — | US | disclosed |
| US-20050227169-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| US-20050095530-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-05 | — | — | US | disclosed |
| EP-1508835-A2 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2005-02-23 | — | — | EP | disclosed |
| US-6509125-B1 | Colored layers containing a dye-bonded polymer | TOPPAN PRINTING CO., LTD. (JP) | 2003-01-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | CD63, SLC39A3, ZRANB2 | SLC6A2 1916/4885KEAP1 4149/4885TSHR 76/4885 |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | SCO2, SOD1, SPOP | SLC6A2 1083/4885KEAP1 4768/4885TSHR 1394/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.