Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Nitrous Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.67 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.67 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.67 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Nitrous Acid SCHEMBL14876441 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL9614571 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL9994538 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL72504 | 0.88 | — | — | |
| Nitrous Acid SCHEMBL557728 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL23910148 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL1659698 | 0.88 | — | — | |
| Nitrous Acid SCHEMBL1656761 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL21830598 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 | |
| Nitrous Acid SCHEMBL1965249 | 0.88 | ALDH1A1 (0.67) | ALDH1A1ALOX15TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113694894-A | Porous fluid and preparation method and application thereof | 湖南大学 | 2021-11-26 | — | — | CN | claimed |
| EP-3189914-B1 | BONDING MATERIAL AND BONDING METHOD USING SAME | DOWA ELECTRONICS MATERIALS CO LTD (JP) | 2022-06-08 | — | — | EP | disclosed |
| CN-113694894-A | Porous fluid and preparation method and application thereof | 湖南大学 | 2021-11-26 | — | — | CN | disclosed |
| CN-107249787-B | Adhesive material and adhesion method using the same | 同和电子科技有限公司 | 2020-12-01 | — | — | CN | disclosed |
| US-10821558-B2 | Bonding material and bonding method using same | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2020-11-03 | — | — | US | disclosed |
| US-20170252874-A1 | BONDING MATERIAL AND BONDING METHOD USING SAME | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| EP-3189914-A1 | BONDING MATERIAL AND BONDING METHOD USING SAME | DOWA Electronics Materials Co., Ltd. (JP) | 2017-07-12 | — | — | EP | disclosed |
| CN-1027065-C | Tetralin esters of phenols or benzoic acids | ALLERGAN INC (US) | 1994-12-21 | — | — | CN | disclosed |
| US-5070058-A | TWO-STEP VACUUM IMPREGNATION OF SUPPORT | TEXACO, INC. (US) | 1991-12-03 | — | — | US | disclosed |
| CN-1038092-A | The preparation method of the tetraline ester of phenol or benzoic acids | ALLERGAN INC (US) | 1989-12-20 | — | — | CN | disclosed |