SCHEMBL984070

SCHEMBL984070

CCC(CC)c1ccc(O)cc1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.72
ESR2 Q92731 8/20 0.72
CYP2C9 P11712 2/20 0.65
TDP1 Q9NUW8 2/20 0.65
LMNA P02545 1/20 0.65
CYP1A2 P05177 1/20 0.65
PGR P06401 1/20 0.65
CHRM2 P08172 1/20 0.65
CYP3A4 P08684 1/20 0.65
ADORA3 P0DMS8 1/20 0.65
AR P10275 1/20 0.65
CYP2D6 P10635 1/20 0.65
MAPT P10636 1/20 0.65
CHRM1 P11229 1/20 0.65
ALOX15 P16050 1/20 0.65
DRD1 P21728 1/20 0.65
TBXA2R P21731 1/20 0.65
PTGS1 P23219 1/20 0.65
SLC6A2 P23975 1/20 0.65
CYP2C19 P33261 1/20 0.65

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5607945 0.88 ESR1 (0.64) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL15427906 0.86 ESR1 (0.69) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL12201279 0.84 ESR1 (0.60) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL27982158 0.84 ESR1 (0.60) ESR1ESR2CYP2C9TDP1LMNA
Isobutesrol SCHEMBL5694505 0.84 ESR1 (1.00) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL23774423 0.83 ESR1 (0.58) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL12835878 0.83 ESR1 (0.58) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL12384051 0.83 ESR1 (0.58) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL28125000 0.83 ESR1 (0.58) ESR1ESR2CYP2C9TDP1LMNA
SCHEMBL14411084 0.83 ESR1 (0.58) ESR1ESR2CYP2C9TDP1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4446310-A1 METHOD FOR PRODUCING BLOCKED ISOCYANATE COMPOUND AND METHOD FOR PRODUCING ISOCYANATE COMPOUND Asahi Kasei Kabushiki Kaisha (JP) 2024-10-16 EP disclosed
CN-118382612-A Method for producing blocked isocyanate compound and method for producing isocyanate compound 旭化成株式会社 2024-07-23 CN disclosed
US-20240210827-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-06-27 US disclosed
US-20230384674-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-30 US disclosed
US-11829068-B2 Resist composition, method of forming resist pattern, compound, and resin TOKYO OHKA KOGYO CO., LTD. (JP) 2023-11-28 US disclosed
US-11822240-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-11-21 US disclosed
US-11709427-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 US disclosed
WO-2023106377-A1 METHOD FOR PRODUCING BLOCKED ISOCYANATE COMPOUND AND METHOD FOR PRODUCING ISOCYANATE COMPOUND 旭化成株式会社 2023-06-15 WO disclosed
US-11634386-B2 Method for producing diphenylsulfone compound KONISHI CHEMICAL IND. CO. LTD. (JP) 2023-04-25 US disclosed
US-20220306572-A1 METHOD FOR PRODUCING DIPHENYLSULFONE COMPOUND KONISHI CHEMICAL IND. CO. LTD. (JP) 2022-09-29 US disclosed
EP-2147909-A1 METHOD FOR PRODUCTION OF ISOCYANATE USING COMPOSITION COMPRISING CARBAMIC ACID ESTER AND AROMATIC HYDROXY COMPOUND, AND COMPOSITION FOR TRANSPORT OR STORAGE OF CARBAMIC ACID ESTER Asahi Kasei Chemicals Corporation (JP) 2010-01-27 EP disclosed
US-7534555-B2 Plating using copolymer HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (NL) 2009-05-19 US disclosed
US-20090062213-A1 Small Molecule Inhibitors of PDZ Interactions ARBOR VITA CORPORATION (US) 2009-03-05 US disclosed
CN-101171254-A Fused thieno[2,3-B]pyridine and thiazolo[5,4-B]pyridine compounds for inhibiting KSP kinesin activity SCHERING CORP (US) 2008-04-30 CN disclosed
EP-1871776-A2 FUSED THIENO[2,3-B]PYRIDINE AND THIAZOLO[5,4-B]PYRIDINE COMPOUNDS FOR INHIBITING KSP KINESIN ACTIVITY SCHERING CORPORATION (US) 2008-01-02 EP disclosed
US-20060247320-A1 Compounds for inhibiting KSP kinesin activity SCHERING CORPORATION 2006-11-02 US disclosed
WO-2006098961-A2 FUSED THIENO [2, 3-B] PYRIDINE AND THIAZOLO [5, 4-B] PYRIDINE COMPOUNDS FOR INHIBITING KSP KINESIN ACTIVITY SCHERING CORPORATION (US) 2006-09-21 WO disclosed
US-20020120079-A1 Method of homo- or co-polymerization of alpha-olefin SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2002-08-29 US disclosed
EP-0187999-A2 Copolyestercarbonate composition GENERAL ELECTRIC COMPANY (US) 1986-07-23 EP disclosed
US-4029816-A ANTIHYPERTENSIVE, DIURETIC, SALURETIC MERCK & CO., INC. (US) 1977-06-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220306572-A1 METHOD FOR PRODUCING DIPHENYLSULFONE COMPOUND DHPS, TST, IWS1 ESR1 3406/4885ESR2 2311/4885CYP2C9 1359/4885
US-11709427-B2 Positive resist composition and pattern forming process EWSR1, PARG, VIM ESR1 653/4885ESR2 1232/4885CYP2C9 4809/4885
US-20090062213-A1 Small Molecule Inhibitors of PDZ Interactions PDLIM5, DAB2IP, PSD ESR1 4631/4885ESR2 3597/4885CYP2C9 4883/4885
US-11634386-B2 Method for producing diphenylsulfone compound DHPS, TST, IWS1 ESR1 3406/4885ESR2 2311/4885CYP2C9 1359/4885
US-20060247320-A1 Compounds for inhibiting KSP kinesin activity KIFC1, KIF5B, KIF2C ESR1 3878/4885ESR2 3495/4885CYP2C9 4769/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.