SCHEMBL9885352

SCHEMBL9885352

C[C@@H]1CCCCC1C(=O)O

nearest known ligand 0.62

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.62
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA4 P22748 1/20 0.42
MEN1 O00255 1/20 0.41
BLM P54132 1/20 0.41
KMT2A Q03164 1/20 0.41
PEPD P12955 1/20 0.40
ALDH1A1 P00352 2/20 0.39
LMNA P02545 1/20 0.39
KDM4E B2RXH2 1/20 0.39
HTT P42858 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13952183 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL791505 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL265072 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL10556768 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL301766 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL3382944 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL265657 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL11930055 1.00 EPHX1 (0.62) EPHX1CA1CA2CA4MEN1
SCHEMBL6917395 0.97 EPHX1 (0.60) EPHX1CA1CA2CA4MEN1
SCHEMBL12529955 0.97 EPHX1 (0.60) EPHX1CA1CA2CA4MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10030188-B2 Nano-hybrid lubricant and method thereof, and oil-based drilling fluid CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2018-07-24 US disclosed
US-10000684-B2 Drilling fluid additive composition, and oil-based drilling fluid and use thereof CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2018-06-19 US disclosed
US-20170349803-A1 DRILLING FLUID ADDITIVE COMPOSITION, AND OIL-BASED DRILLING FLUID AND USE THEREOF CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-12-07 US disclosed
US-20170349802-A1 NANO-HYBRID LUBRICANT AND METHOD THEREOF, AND OIL-BASED DRILLING FLUID CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-12-07 US disclosed
US-9834717-B1 Drilling fluid additive composition and pseudo oil-based drilling fluid suitable for horizontal shale gas wells CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-12-05 US disclosed
US-20170335163-A1 DRILLING FLUID ADDITIVE COMPOSITION AND PSEUDO OIL-BASED DRILLING FLUID SUITABLE FOR HORIZONTAL SHALE GAS WELLS CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-11-23 US disclosed
US-9790417-B1 High-density water-based drilling fluid suitable for horizontal shale gas wells CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-10-17 US disclosed
US-9783726-B1 Environment-friendly water-based drilling fluid applicable to horizontal shale gas wells CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-10-10 US disclosed
US-9783725-B1 Drilling fluid additive composition and water-based drilling fluid suitable for horizontal shale gas wells CHINA UNIVERSITY OF PETROLEUM (BEIJING) (CN) 2017-10-10 US disclosed
US-9778568-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-03 US disclosed
US-20090233223-A1 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
EP-2101217-A1 Sulfonium salt-containing polymer, resist compositon, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed
US-20090202943-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-13 US disclosed
US-20090202943-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-13 US disclosed
US-7541133-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-06-02 US disclosed
US-20090061358-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS PROXIMAL SYSTEMS CORPORATION 2009-03-05 US disclosed
US-20080268370-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-10-30 US disclosed
US-20080268370-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-10-30 US disclosed
US-20080254386-A1 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-10-16 US disclosed
US-20080124652-A1 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-05-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170349803-A1 DRILLING FLUID ADDITIVE COMPOSITION, AND OIL-BASED DRILLING FLUID AND USE THEREOF AQP1, AHR, KMO EPHX1 607/4885CA1 1840/4885CA2 2876/4885
US-20090061358-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS RER1, CRY1, CYP21A2 EPHX1 461/4885CA1 296/4885CA2 684/4885
US-10000684-B2 Drilling fluid additive composition, and oil-based drilling fluid and use thereof AQP1, AHR, KMO EPHX1 613/4885CA1 1924/4885CA2 2887/4885
US-10030188-B2 Nano-hybrid lubricant and method thereof, and oil-based drilling fluid AQP1, AQP3, NEK4 EPHX1 686/4885CA1 460/4885CA2 2136/4885
US-20170349802-A1 NANO-HYBRID LUBRICANT AND METHOD THEREOF, AND OIL-BASED DRILLING FLUID AQP1, AQP3, LIPA EPHX1 1947/4885CA1 741/4885CA2 2363/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.