SCHEMBL991493

SCHEMBL991493

CCCOc1cccc2c(O)cccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.56
CNR1 P21554 2/20 0.50
CNR2 P34972 2/20 0.50
CYP2A6 P11509 1/20 0.47
GAA P10253 4/20 0.47
MAPT P10636 3/20 0.47
JAK2 O60674 2/20 0.47
LMNA P02545 1/20 0.47
HTR1B P28222 4/20 0.45
ESR1 P03372 6/20 0.44
ESR2 Q92731 6/20 0.44
HTR1D P28221 1/20 0.44
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
ALOX15 P16050 2/20 0.44
HSD17B10 Q99714 2/20 0.44
USP2 O75604 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
APP P05067 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5596066 0.91 IDO1 (0.54) IDO1CNR1CNR2GAAMAPT
SCHEMBL9315152 0.89 IDO1 (0.53) IDO1CNR1CNR2GAAMAPT
SCHEMBL30003085 0.89 IDO1 (0.71) IDO1CNR1CNR2GAAMAPT
SCHEMBL2023756 0.89 IDO1 (0.71) IDO1CNR1CNR2GAAMAPT
SCHEMBL8863052 0.88 CYP2A6 (0.56) CNR1CNR2CYP2A6HTR1BHTR1D
SCHEMBL30503979 0.88 CYP2A6 (0.56) CNR1CNR2CYP2A6HTR1BHTR1D
SCHEMBL8746001 0.88 CNR1 (0.53) IDO1CNR1CNR2MAPTLMNA
SCHEMBL9697360 0.88 CNR1 (0.53) IDO1CNR1CNR2MAPTLMNA
SCHEMBL9353430 0.88 CNR1 (0.53) IDO1CNR1CNR2MAPTLMNA
SCHEMBL9578532 0.88 CNR1 (0.53) IDO1CNR1CNR2MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103097426-B Epoxy compounds, solidification compound and cured article thereof DIC CORP. (JP) 2016-03-02 CN disclosed
EP-2557103-B1 EPOXY COMPOUND, CURABLE COMPOSITION, AND CURED PRODUCT THEREOF DAINIPPON INK & CHEMICALS (JP) 2014-11-26 EP disclosed
US-8519065-B2 Epoxy compound, curable composition, and cured product thereof DIC CORPORATION (JP) 2013-08-27 US disclosed
US-20130144030-A1 EPOXY COMPOUND, CURABLE COMPOSITION, AND CURED PRODUCT THEREOF DIC CORPORATION (JP) 2013-06-06 US disclosed
CN-103097426-A Epoxy compound, curable composition, and cured product thereof DAINIPPON INK & CHEMICALS 2013-05-08 CN disclosed
EP-2557103-A1 EPOXY COMPOUND, CURABLE COMPOSITION, AND CURED PRODUCT THEREOF DIC Corporation (JP) 2013-02-13 EP disclosed
EP-2448864-A2 SILICA-BASED PARTICLE COMPOSITION Nalco Company (US) 2012-05-09 EP disclosed
WO-2011028498-A2 CALCIUM-BASED CARRIER PARTICLES NALCO COMPANY (US) 2011-03-10 WO disclosed
WO-2011028496-A2 CALCIUM BASED CARRIER PARTICLES NALCO COMPANY (US) 2011-03-10 WO disclosed
WO-2011028469-A2 CALCIUM BASED CARRIER PARTICLES NALCO COMPANY (US) 2011-03-10 WO disclosed
US-20100331431-A1 SILICA-BASED PARTICLE COMPOSITION NALCO COMPANY 2010-12-30 US disclosed
US-20100330366-A1 SILICA-BASED PARTICLE COMPOSITION NANOSPECIALTIES, LLC 2010-12-30 US disclosed
US-7612217-B2 Sulfonium compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-03 US disclosed
US-7612217-B2 Sulfonium compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-03 US disclosed
US-7439006-B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-10-21 US disclosed
US-7439006-B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-10-21 US disclosed
US-20080081925-A1 Sulfonium compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-03 US disclosed
US-20080081925-A1 Sulfonium compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-03 US disclosed
US-20080076063-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-03-27 US disclosed
US-20080076063-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-03-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080081925-A1 Sulfonium compound SLCO2A1, AFF2, SLCO2B1 IDO1 4394/4885CNR1 508/4885CNR2 525/4885
US-20080076063-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SLC26A3, HCN3, NHERF1 IDO1 4594/4885CNR1 589/4885CNR2 942/4885
US-20130144030-A1 EPOXY COMPOUND, CURABLE COMPOSITION, AND CURED PRODUCT THEREOF HEATR1, EEF1A1, EPN1 IDO1 4224/4885CNR1 398/4885CNR2 965/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.