SCHEMBL9944508

SCHEMBL9944508

Cc1cc([S+](c2ccccc2)c2ccccc2)cc(C)c1OCCCC(F)(F)CC(F)(F)C(F)F

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SCN8A Q9UQD0 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL98127 0.86 SCN8A (0.33) SCN8A
SCHEMBL10169610 0.77 SCN8A (0.34) SCN8A
SCHEMBL2601698 0.74 SCN8A (0.33) SCN8A
SCHEMBL10170775 0.74 LTA4H (0.46) SCN8A
SCHEMBL98712 0.72 THRA (0.47)
SCHEMBL13052218 0.71 SCN4A (0.38) SCN8A
SCHEMBL98608 0.71 KDM4E (0.48)
Hydrochloric Acid SCHEMBL29816199 0.70 SCN4A (0.36) SCN8A
SCHEMBL98571 0.69 ALDH1A1 (0.41)
SCHEMBL98141 0.67 KMT2A (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120148956-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed