SCHEMBL9949459

SCHEMBL9949459

c1cc(C2OCCO2)ccc1CCCC1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CEL P19835 3/20 0.41
CCR5 P51681 1/20 0.39
SLC18A3 Q16572 1/20 0.39
HRH3 Q9Y5N1 1/20 0.37
SPHK1 Q9NYA1 2/20 0.36
SIGMAR1 Q99720 1/20 0.36
CYP1A2 P05177 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
KDM1A O60341 1/20 0.35
MAOA P21397 1/20 0.35
MAOB P27338 1/20 0.35
BCHE P06276 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950477 0.90 CEL (0.39) CELMAOAMAOBRAB9A
SCHEMBL9950786 0.80 LTA4H (0.41) CELSLC18A3HRH3RAB9A
SCHEMBL9950143 0.75 MAOB (0.40) HRH3SPHK1MEN1KMT2AMAOA
SCHEMBL9951286 0.75 ALOX5 (0.35) HRH3SIGMAR1MAOAMAOB
SCHEMBL9950391 0.75 MAOB (0.38) MAOAMAOB
SCHEMBL15074365 0.75 MEN1 (0.33) SPHK1MEN1KMT2A
SCHEMBL28123466 0.75 SPHK1 (0.45) SPHK1RAB9A
SCHEMBL3016280 0.75 CA2 (0.41) SPHK1MEN1KMT2ARAB9A
SCHEMBL2439387 0.75 HRH1 (0.49) CELCCR5SLC18A3HRH3SIGMAR1
SCHEMBL2443148 0.75 CYP1A2 (0.50) CELCCR5SLC18A3HRH3SPHK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP claimed
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 CEL 2007/4885CCR5 889/4885SLC18A3 4798/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.