SCHEMBL9950477

SCHEMBL9950477

c1cc(C2OCCO2)ccc1CCC1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CEL P19835 4/20 0.39
DAO P14920 2/20 0.37
ALOX5 P09917 1/20 0.37
CTSD P07339 1/20 0.34
MAOB P27338 4/20 0.33
MAOA P21397 1/20 0.33
CTSS P25774 1/20 0.33
CTSK P43235 1/20 0.33
PDGFRB P09619 1/20 0.33
PDGFRA P16234 1/20 0.33
RAB9A P51151 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9949459 0.90 CEL (0.41) CELMAOBMAOARAB9A
SCHEMBL9950143 0.84 MAOB (0.40) ALOX5MAOBMAOA
SCHEMBL9950391 0.84 MAOB (0.38) ALOX5MAOBMAOA
SCHEMBL9951286 0.84 ALOX5 (0.35) ALOX5MAOBMAOA
SCHEMBL9950786 0.83 LTA4H (0.41) CELRAB9A
SCHEMBL9949861 0.82 ALOX5 (0.33) ALOX5MAOBMAOA
SCHEMBL9950998 0.82 ALOX5 (0.33) ALOX5
SCHEMBL9949878 0.82 MAOA (0.35) ALOX5MAOBMAOARAB9A
SCHEMBL9951096 0.81 OPRM1 (0.39) CELDAOMAOBMAOA
SCHEMBL9950180 0.78 ADRA2A (0.34) ALOX5CTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP claimed
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 CEL 2007/4885DAO 4770/4885ALOX5 2157/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.