Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 1/20 | 0.34 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.34 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.34 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.34 |
| ▸ | CTSK | P43235 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9950609 | 0.85 | CA1 (0.35) | ADRA2AADRA2BADRA2CALOX5CTSK | |
| SCHEMBL9949584 | 0.85 | ADRA2A (0.34) | ADRA2AADRA2BADRA2CALOX5CTSK | |
| SCHEMBL9949398 | 0.85 | ADRA2A (0.32) | ADRA2AADRA2BADRA2C | |
| SCHEMBL9949826 | 0.83 | ALDH1A1 (0.35) | ADRA2AADRA2BADRA2CCTSK | |
| SCHEMBL9950477 | 0.78 | CEL (0.39) | ALOX5CTSK | |
| SCHEMBL16191266 | 0.78 | HRH3 (0.45) | CTSK | |
| SCHEMBL6292647 | 0.76 | ALDH1A1 (0.44) | CTSK | |
| SCHEMBL16191303 | 0.76 | SLC18A2 (0.50) | ADRA2AADRA2BADRA2CCTSK | |
| SCHEMBL9951286 | 0.76 | ALOX5 (0.35) | ALOX5 | |
| SCHEMBL9950998 | 0.74 | ALOX5 (0.33) | ALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | claimed |
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-8748078-B2 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-06-10 | — | — | US | disclosed |
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, RER1, REV1 | ADRA2A 2623/4885ADRA2B 2455/4885ADRA2C 2563/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.