SCHEMBL1005540

SCHEMBL1005540

[CH2]CCCCCCCCCCOCC=C

nearest known ligand 0.46

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.40
POLB P06746 1/20 0.40
KMT2A Q03164 1/20 0.40
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
ALDH1A1 P00352 2/20 0.32
CA9 Q16790 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
CA7 P43166 1/20 0.31
CYP3A4 P08684 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3679043 1.00 MEN1 (0.40) MEN1POLBKMT2ACA1CA2
SCHEMBL923937 1.00 MEN1 (0.40) MEN1POLBKMT2ACA1CA2
SCHEMBL9484160 1.00 MEN1 (0.40) MEN1POLBKMT2ACA1CA2
SCHEMBL9483038 1.00 MEN1 (0.40) MEN1POLBKMT2ACA1CA2
SCHEMBL9483893 1.00 MEN1 (0.40) MEN1POLBKMT2ACA1CA2
SCHEMBL28269242 0.98 MEN1 (0.39) MEN1POLBKMT2ACA1CA2
SCHEMBL459575 0.97
SCHEMBL28632214 0.95 MEN1 (0.40) MEN1POLBKMT2ACA1CA2
SCHEMBL3430285 0.93 MEN1 (0.39) MEN1POLBKMT2ACA1CA2
SCHEMBL926527 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10777809-B2 Method for producing negative electrode active material for lithium ion secondary batteries JNC CORPORATION (JP) 2020-09-15 US disclosed
EP-3442060-B1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC CORP (JP) 2020-06-03 EP disclosed
US-20190131621-A1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC CORPORATION (JP) 2019-05-02 US disclosed
EP-3442060-A1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC Corporation (JP) 2019-02-13 EP disclosed
US-9817312-B2 Silicon-containing heat- or photo-curable composition AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) 2017-11-14 US disclosed
US-20160266490-A1 SILICON-CONTAINING HEAT- OR PHOTO-CURABLE COMPOSITION AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2016-09-15 US disclosed
EP-3061792-A1 SILICON-CONTAINING HEAT- OR PHOTO-CURABLE COMPOSITION AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2016-08-31 EP disclosed
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME CHISSO PETROCHEMICAL CORPORATION (JP) 2014-09-18 US disclosed
EP-1548020-B1 SILICON COMPOUND JNC CORP (JP) 2014-07-23 EP disclosed
EP-1550664-B1 SILICON COMPOUND JNC CORP (JP) 2012-06-27 EP disclosed
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers JNC CORPORATION (JP) 2005-12-29 US disclosed
US-20050250925-A1 Silicon compound JNC CORPORATION (JP) 2005-11-10 US disclosed
US-20050215807-A1 Silsesquioxane derivative JNC CORPORATION (JP) 2005-09-29 US disclosed
EP-1550664-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-07-06 EP disclosed
EP-1548020-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-06-29 EP disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 EP disclosed
US-20040068074-A1 Production process for silsesquioxane derivative having functional group and silsesquioxane derivative JNC CORPORATION (JP) 2004-04-08 US disclosed
US-20040030084-A1 Production process for silsesquioxane derivative and silsesquioxane derivative JNC CORPORATION (JP) 2004-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME PIEZO1, PFAS, MCM6 MEN1 2051/4885POLB 728/4885KMT2A 1925/4885
US-20050215807-A1 Silsesquioxane derivative STS, SFXN1, SULT1A1 MEN1 3228/4885POLB 2890/4885KMT2A 1372/4885
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers STS, SULT1A1, SRM MEN1 4416/4885POLB 3056/4885KMT2A 728/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.