Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.40 |
| ▸ | IDO1 | P14902 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
| ▸ | PNMT | P11086 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31005108 | 1.00 | TSHR (0.56) | TSHRLMNAALDH1A1CYP2A6CYP1A2 | |
| SCHEMBL3201226 | 0.83 | TSHR (0.45) | TSHRLMNAALDH1A1CYP2A6CYP1A2 | |
| SCHEMBL31005119 | 0.83 | TSHR (0.45) | TSHRLMNAALDH1A1CYP2A6CYP1A2 | |
| SCHEMBL31005101 | 0.83 | TSHR (0.45) | TSHRLMNAALDH1A1CYP2A6CYP1A2 | |
| SCHEMBL2222737 | 0.83 | TSHR (0.45) | TSHRLMNAALDH1A1CYP2A6CYP1A2 | |
| Acetic Acid SCHEMBL11136830 | 0.81 | POLB (0.42) | TSHRLMNAALDH1A1POLBCES2 | |
| SCHEMBL5085586 | 0.75 | TSHR (0.50) | TSHRLMNAALDH1A1CYP2A6CYP1A2 | |
| 1,2-Dichlorobenzene SCHEMBL5190 | 0.73 | — | — | |
| 1,2-Dichlorobenzene SCHEMBL10593125 | 0.73 | — | — | |
| 1,2-Dichlorobenzene SCHEMBL1155123 | 0.73 | TSHR (1.00) | TSHRLMNAALDH1A1CYP2A6CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| EP-2065449-B1 | Ink composition for inkjet recording, inkjet recording method, and printed material | FUJIFILM CORP (JP) | 2016-01-06 | — | — | EP | disclosed |
| EP-2105480-B1 | Ink composition, ink for inkjet recording and ink set using the ink | FUJIFILM CORP (JP) | 2014-12-10 | — | — | EP | disclosed |
| EP-2570853-B1 | Oxygen-blocking film and lithographic printing plate precursor comprising said film | FUJIFILM CORP (JP) | 2014-08-20 | — | — | EP | disclosed |
| US-8710123-B2 | Ink composition, ink for inkjet recording and ink set using the ink | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20130071786-A1 | COATING COMPOSITION AND IMAGE-FORMING MATERIAL, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND OXYGEN-BLOCKING FILM INCLUDING THE COATING COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-03-21 | — | — | US | disclosed |
| EP-2570853-A2 | Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition | Fujifilm Corporation (JP) | 2013-03-20 | — | — | EP | disclosed |
| EP-2065449-A2 | Ink composition for inkjet recording, inkjet recording method, and printed material | FUJIFILM Corporation (JP) | 2009-06-03 | — | — | EP | disclosed |
| US-20090088491-A1 | PHOTO-CURABLE COMPOSITION INCLUDING POLYMERIZABLE COMPOUND, POLYMERIZATION INITIATOR, AND DYE | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-2042570-A1 | Photo-curable composition including polymerizable compound, polymerization initiator, and dye | FUJIFILM Corporation (JP) | 2009-04-01 | — | — | EP | disclosed |
| EP-1757635-B1 | Curable ink comprising modified oxetane compound | FUJIFILM CORP (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20070112088-A1 | Curable composition, ink composition, inkjet recording method, printer matter, method for producing planographic printing plate, planographic printing plate and oxetane compound | FUJIFILM CORPORATION | 2007-05-17 | — | — | US | disclosed |
| EP-1783184-A1 | Curable ink composition and oxetane compound | Fujifilm Corporation (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-20070049651-A1 | Curable composition, ink composition, inkjet recording method, printed material, method of producing planographic printing plate, planographic printing plate, and oxcetane compound | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| EP-1757635-A1 | Curable modified oxetane compound and ink composition comprising it | Fuji Photo Film Co., Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | TSHR 2626/4885LMNA 4638/4885ALDH1A1 565/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | TSHR 3426/4885LMNA 4520/4885ALDH1A1 713/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | TSHR 988/4885LMNA 4640/4885ALDH1A1 1564/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.