Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR7 | P34969 | 15/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10180106 | 0.94 | PTGS2 (0.52) | HTR7PTGS2ALDH1A1L3MBTL1FKBP1A | |
| SCHEMBL10180072 | 0.86 | PTGS2 (0.45) | HTR7PTGS2ALDH1A1POLBNPC1 | |
| SCHEMBL10178699 | 0.86 | HTR7 (0.44) | HTR7 | |
| SCHEMBL10178704 | 0.81 | PTGS2 (0.54) | HTR7PTGS2ALDH1A1POLBNPC1 | |
| SCHEMBL13144176 | 0.78 | LMNA (0.60) | PTGS2ALDH1A1POLBMEN1LMNA | |
| SCHEMBL10178531 | 0.76 | PPARA (0.43) | ALDH1A1L3MBTL1FKBP1ANPC1LMNA | |
| SCHEMBL10178546 | 0.75 | HDAC4 (0.43) | HTR7PTGS2ALDH1A1POLBLMNA | |
| SCHEMBL8681618 | 0.74 | ALDH1A1 (0.54) | ALDH1A1L3MBTL1NPC1LMNARAB9A | |
| SCHEMBL10178695 | 0.73 | RAB9A (0.51) | ALDH1A1L3MBTL1NPC1LMNARAB9A | |
| SCHEMBL15722851 | 0.73 | SMPD1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |