SCHEMBL10180106

SCHEMBL10180106

CCC(C)c1ccc(CCC(=O)n2c3ccccc3c(=O)c3ccccc32)cc1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ PTGS2 P35354 3/20 0.52
▸ P2RX4 Q99571 2/20 0.48
▸ HTR7 P34969 7/20 0.40
▸ ALDH1A1 P00352 2/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ CASP3 P42574 1/20 0.39
▸ CASP7 P55210 1/20 0.39
▸ FKBP1A P62942 1/20 0.38
▸ MEN1 O00255 1/20 0.38
▸ NPC1 O15118 1/20 0.38
▸ LMNA P02545 1/20 0.38
▸ RAB9A P51151 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ NTRK1 P04629 1/20 0.38
▸ RXFP1 Q9HBX9 1/20 0.38
▸ CNR2 P34972 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178700 0.94 HTR7 (0.45) PTGS2HTR7ALDH1A1L3MBTL1FKBP1A
SCHEMBL10178704 0.88 PTGS2 (0.54) PTGS2P2RX4HTR7ALDH1A1CASP3
SCHEMBL10180072 0.81 PTGS2 (0.45) PTGS2P2RX4HTR7ALDH1A1NPC1
SCHEMBL10178699 0.81 HTR7 (0.44) HTR7CASP3CASP7
SCHEMBL13144175 0.80 P2RX4 (0.61) PTGS2P2RX4ALDH1A1MEN1LMNA
SCHEMBL6722016 0.77 P2RX4 (0.64) PTGS2P2RX4ALDH1A1MEN1KMT2A
SCHEMBL10178531 0.76 PPARA (0.43) ALDH1A1L3MBTL1CASP3CASP7FKBP1A
SCHEMBL13144176 0.72 LMNA (0.60) PTGS2P2RX4ALDH1A1MEN1LMNA
SCHEMBL8681618 0.71 ALDH1A1 (0.54) ALDH1A1L3MBTL1NPC1LMNARAB9A
SCHEMBL10178695 0.71 RAB9A (0.51) ALDH1A1L3MBTL1CASP3NPC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 — — US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 — — US disclosed
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