Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.56 |
| ▸ | MAPT | P10636 | 4/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178559 | 0.90 | MEN1 (0.48) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL10178457 | 0.87 | LMNA (0.60) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL10178573 | 0.80 | KDM4E (0.48) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL10178720 | 0.78 | ALDH1A1 (0.49) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL10178729 | 0.77 | L3MBTL1 (0.54) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL6722042 | 0.76 | LMNA (0.49) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL15709446 | 0.75 | LMNA (1.00) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL30919327 | 0.75 | LMNA (1.00) | LMNASMN1; SMN2ALDH1A1KDM4EMAPT | |
| SCHEMBL10178727 | 0.74 | MAPT (0.45) | LMNASMN1; SMN2ALDH1A1MAPTL3MBTL1 | |
| SCHEMBL10178744 | 0.74 | CHRNB2 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |