Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Malonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Malonic Acid SCHEMBL28920109 | 0.94 | CA4 (0.59) | — | |
| Malonic Acid SCHEMBL31665937 | 0.93 | CA4 (0.60) | — | |
| Malonic Acid SCHEMBL31665936 | 0.93 | CA4 (0.60) | — | |
| Malonic Acid SCHEMBL107187 | 0.93 | — | — | |
| Malonic Acid SCHEMBL106382 | 0.93 | — | — | |
| Malonic Acid SCHEMBL10391172 | 0.90 | LDHA (0.60) | — | |
| Malonic Acid SCHEMBL17338711 | 0.90 | CA4 (0.67) | — | |
| Malonic Acid SCHEMBL30776750 | 0.90 | CA4 (0.67) | — | |
| Malonic Acid SCHEMBL9571080 | 0.90 | — | — | |
| Malonic Acid SCHEMBL27904434 | 0.90 | CA4 (0.73) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4072522-B1 | MALONATE SALT FOR USE IN THE TREATMENT OR PREVENTION OF ISCHAEMIC STROKE REPERFUSION INJURY | CAMBRIDGE ENTPR LTD (GB) | 2026-01-28 | — | — | EP | claimed |
| CN-114307984-B | Preparation method and application of carbon-based adsorption material | 南通市疾病预防控制中心 | 2023-11-03 | — | — | CN | claimed |
| US-20220409562-A1 | Treatment or Prevention of Ischaemic Stroke Reperfusion Injury | CAMBRIDGE ENTERPRISE LIMITED (GB) | 2022-12-29 | — | — | US | claimed |
| EP-4072522-A1 | TREATMENT OR PREVENTION OF ISCHAEMIC STROKE REPERFUSION INJURY | Cambridge Enterprise Limited (GB) | 2022-10-19 | — | — | EP | claimed |
| CN-112877737-B | Method for coating hydroxyl graphene modified electrophoretic paint on nickel-free stainless steel and protective coating | 广州超邦化工有限公司 | 2021-12-24 | — | — | CN | claimed |
| WO-2021116670-A1 | TREATMENT OR PREVENTION OF ISCHAEMIC STROKE REPERFUSION INJURY | CAMBRIDGE ENTERPRISE LIMITED (GB) | 2021-06-17 | — | — | WO | claimed |
| CN-112877737-A | Method for coating hydroxyl graphene modified electrophoretic paint on nickel-free stainless steel and protective coating | 广州超邦化工有限公司 | 2021-06-01 | — | — | CN | claimed |
| CN-109610229-B | Preparation method of self-fluffy electromagnetic shielding paper | 东北林业大学 | 2021-04-06 | — | — | CN | claimed |
| EP-2475000-B1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEM IND LTD (JP) | 2015-07-01 | — | — | EP | claimed |
| US-9034810-B2 | Processing agent composition for semiconductor surface and method for processing semiconductor surface using same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-19 | — | — | US | claimed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | claimed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | claimed |
| US-5821030-A | DIRECT DIGITAL EXPOSURE; HIGH WRITING SPEED; ADHESION; ANTIFOGGING AGENTS; SHELF LIFE; USING A POLYCARBOXYLIC ACID IN THE PHOTOPOLYMERIZATION INITIATOR SYSTEM AND A BASIC COMPOUND IN THE OXYGEN BARRIER LAYER | KODAK POLYCHROME GRAPHICS (US) | 1998-10-13 | — | — | US | claimed |
| WO-2026105439-A1 | LEATHER SURFACE TREATMENT AGENT AND LEATHER TREATED USING SAME | 日華化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| US-5821030-A | DIRECT DIGITAL EXPOSURE; HIGH WRITING SPEED; ADHESION; ANTIFOGGING AGENTS; SHELF LIFE; USING A POLYCARBOXYLIC ACID IN THE PHOTOPOLYMERIZATION INITIATOR SYSTEM AND A BASIC COMPOUND IN THE OXYGEN BARRIER LAYER | KODAK POLYCHROME GRAPHICS (US) | 1998-10-13 | — | — | US | disclosed |
| US-5776655-A | CONTAINING PHOTOPOLYMER | EASTMAN KODAK COMPANY (US) | 1998-07-07 | — | — | US | disclosed |
| EP-0795790-A2 | Peel-developable lithographic printing plate | EASTMAN KODAK COMPANY (US) | 1997-09-17 | — | — | EP | disclosed |
| EP-0558311-A1 | Light-sensitive lithographic printing plate | KONICA CORPORATION (JP) | 1993-09-01 | — | — | EP | disclosed |