Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Salicylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.79 |
| ▸ | HPGD | P15428 | 8/20 | 0.79 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.79 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | CA12 | O43570 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 1/20 | 0.52 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.52 |
| ▸ | CA4 | P22748 | 1/20 | 0.52 |
| ▸ | CA6 | P23280 | 1/20 | 0.52 |
| ▸ | CA7 | P43166 | 1/20 | 0.52 |
| ▸ | CA9 | Q16790 | 1/20 | 0.52 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.52 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 7/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 7/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | NPC1 | O15118 | 3/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Salicylic Acid SCHEMBL6249450 | 0.91 | KDM4E (0.95) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL8589272 | 0.90 | KDM4E (0.70) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL5142971 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL299753 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL455422 | 0.89 | KDM4E (1.00) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL1932763 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL10490726 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL224818 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL3399561 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 | |
| Salicylic Acid SCHEMBL217212 | 0.89 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-20050074556-A1 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. | 2005-04-07 | — | — | US | disclosed |
| US-6797682-B2 | TO STRIP A PHOTORESIST LAYER AND A TITANIUM OXIDE IN PRODUCTION OF E.G. SEMICONDUCTOR INTEGRATED CIRCUITS, PRINTED WIRING BOARDS AND LIQUID CRYSTALS | TOSOH CORPORATION (JP) | 2004-09-28 | — | — | US | disclosed |
| EP-0708452-B1 | Ion-conductive polymer electrolyte, method for producing the electrolyte and capacitors using the electrolyte | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2004-05-26 | — | — | EP | disclosed |
| US-20030233008-A1 | Process for the preparation of carboxylic benzyl esters | BAYER AKTIENGESELLSCHAFT (DE) | 2003-12-18 | — | — | US | disclosed |
| EP-1371627-A1 | Process for the preparation of carboxylic acid benzyl esters | Bayer Aktiengesellschaft (DE) | 2003-12-17 | — | — | EP | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20020128164-A1 | Resist stripper | TOSOH CORPORATION | 2002-09-12 | — | — | US | disclosed |
| EP-1211563-A1 | Resist stripper | Tosoh Corporation (JP) | 2002-06-05 | — | — | EP | disclosed |
| EP-0708452-A1 | Ion-conductive polymer electrolyte, method for producing the electrolyte and capacitors using the electrolyte | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-04-24 | — | — | EP | disclosed |
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030233008-A1 | Process for the preparation of carboxylic benzyl esters | CPS1, BCAT2, BCAT1 | KDM4E 144/4885HPGD 3716/4885ALDH1A1 1490/4885 |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | KDM4E 650/4885HPGD 4319/4885ALDH1A1 1668/4885 |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | KDM4E 799/4885HPGD 4385/4885ALDH1A1 2163/4885 |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | KDM4E 757/4885HPGD 4883/4885ALDH1A1 4472/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | KDM4E 588/4885HPGD 4878/4885ALDH1A1 4452/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | KDM4E 2013/4885HPGD 4586/4885ALDH1A1 1558/4885 |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SMURF1, OSR1, SIK1 | KDM4E 2013/4885HPGD 4870/4885ALDH1A1 4150/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.