Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 2/20 | 0.44 |
| ▸ | CA9 | Q16790 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 2/20 | 0.42 |
| ▸ | CES1 | P23141 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | PTPN11 | Q06124 | 2/20 | 0.42 |
| ▸ | PLK1 | P53350 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL106854 | 0.93 | TSHR (0.47) | ALDH1A1TSHRKDM4EMEN1KMT2A | |
| Tetrabuthylammonium SCHEMBL106855 | 0.92 | ALDH1A1 (0.54) | ALDH1A1TSHRALOX15CA12CA9 | |
| Tetrapropylammonium SCHEMBL105671 | 0.90 | ALDH1A1 (0.48) | ALDH1A1TSHRALOX15CA12CA9 | |
| Tetrabuthylammonium SCHEMBL11218875 | 0.88 | KDM4E (0.53) | ALDH1A1TSHRCA12CA9KDM4E | |
| Tetrabuthylammonium SCHEMBL28459959 | 0.87 | TSHR (0.42) | ALDH1A1TSHRKDM4EMEN1KMT2A | |
| Tetrabuthylammonium SCHEMBL10735564 | 0.87 | ALDH1A1 (0.53) | ALDH1A1TSHRCA12CA9KDM4E | |
| Phthalic Acid SCHEMBL8438178 | 0.86 | ALDH1A1 (0.47) | ALDH1A1TSHRCA12CA9KDM4E | |
| Cetrimonium SCHEMBL8439271 | 0.86 | ALDH1A1 (0.47) | ALDH1A1TSHRCA12CA9KDM4E | |
| Phthalic Acid SCHEMBL8434740 | 0.86 | ALDH1A1 (0.47) | ALDH1A1TSHRCA12CA9KDM4E | |
| Tetrabuthylammonium SCHEMBL28624852 | 0.86 | CYP3A4 (0.50) | ALDH1A1TSHRKDM4EMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| CN-112526822-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2025-02-28 | — | — | CN | disclosed |
| US-5959028-A | UNSATURATED CARBONYL COMPOUND AND ACTIVE METHYLENE GROUP COMPOUND, ASYMMETRIC MALONATE ESTER FOR PROTECTIVE COATINGS | NIPPON PAINT CO., LTD. (JP) | 1999-09-28 | — | — | US | disclosed |
| US-5933693-A | Electroconductive elastic member and electrophotographic apparatus using same | BRIDGESTONE CORPORATION (JP) | 1999-08-03 | — | — | US | disclosed |
| EP-0651023-B1 | Curable resin composition for coating uses | NIPPON PAINT CO LTD (JP) | 1999-07-14 | — | — | EP | disclosed |
| EP-0737726-B1 | One-component, thermosetting resin composition for coating use | NIPPON PAINT CO LTD (JP) | 1999-07-14 | — | — | EP | disclosed |
| US-5911099-A | Electroconductiive member and electrophotogrpahic apparatus | BRIDGESTONE CORPORATION (JP) | 1999-06-08 | — | — | US | disclosed |
| US-5827928-A | MICHAEL REACTION CURABLE; CATALYZED WITH A QUATERNARY COMPOUND IN THE PRESENCE OF A FIVE-MEMBERED CYCLIC CARBONATE | NIPPON PAINT CO., LTD. (JP) | 1998-10-27 | — | — | US | disclosed |
| EP-0808860-A2 | Curable resin composition for coating use | NIPPON PAINT CO., LTD. (JP) | 1997-11-26 | — | — | EP | disclosed |
| EP-0737726-A1 | One-component, thermosetting resin composition for coating use | Nippon Paint Co., Ltd. (JP) | 1996-10-16 | — | — | EP | disclosed |
| US-5565525-A | CURABLE THROUGH MICHAEL REACTION | NIPPON PAINT CO., LTD. (JP) | 1996-10-15 | — | — | US | disclosed |
| EP-0651023-A2 | Curable resin composition for coating uses | Nippon Paint Co., Ltd. (JP) | 1995-05-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | ALDH1A1 1586/4885TSHR 4787/4885ALOX15 2855/4885 |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | ALDH1A1 4472/4885TSHR 3217/4885ALOX15 2512/4885 |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | ALDH1A1 4644/4885TSHR 439/4885ALOX15 2677/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | ALDH1A1 4452/4885TSHR 770/4885ALOX15 4108/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | ALDH1A1 1558/4885TSHR 446/4885ALOX15 326/4885 |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SMURF1, OSR1, SIK1 | ALDH1A1 4150/4885TSHR 2745/4885ALOX15 1928/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.