Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.79 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.79 |
| ▸ | MMP3 | P08254 | 1/20 | 0.65 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.65 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | KIF11 | P52732 | 2/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | TYR | P14679 | 1/20 | 0.50 |
| ▸ | AR | P10275 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.50 |
| ▸ | HTR6 | P50406 | 1/20 | 0.50 |
| ▸ | ESRRG | P62508 | 1/20 | 0.50 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12004872 | 0.91 | ESR1 (0.70) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL10772499 | 0.91 | ESR1 (0.70) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL26136547 | 0.91 | ESR1 (0.70) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL23082207 | 0.89 | ESR2 (0.63) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL27277 | 0.89 | ESR1 (1.00) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| Phenol SCHEMBL8987629 | 0.89 | ESR1 (0.91) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL8031149 | 0.89 | ESR1 (1.00) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL7935386 | 0.87 | ESR1 (0.79) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL3664594 | 0.87 | LMNA (0.70) | ESR1ESR2MMP3BCL2L1CYP3A4 | |
| SCHEMBL21084882 | 0.87 | ESR1 (0.66) | ESR1ESR2MMP3BCL2L1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-62289536-A | — | — | None | — | — | JP | disclosed |
| JP-62122782-A | — | — | None | — | — | JP | disclosed |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| WO-2018016640-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2018-01-25 | — | — | WO | disclosed |
| JP-S62289536-A | 1-(P-BIPHENYLYL)-1,1-BIS(4'-HYDROXYPHENYL)METHANE DERIVATIVE | IDEMITSU KOSAN CO LTD | 1987-12-16 | — | — | JP | disclosed |
| US-4707464-A | Recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1987-11-17 | — | — | US | disclosed |
| JP-S62122782-A | RECORDING MATERIAL | FUJI PHOTO FILM CO LTD | 1987-06-04 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | ESR1 1539/4885ESR2 2068/4885MMP3 4754/4885 |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | RDX, RTN4, CROCC | ESR1 1453/4885ESR2 1492/4885MMP3 2936/4885 |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | ESR1 1539/4885ESR2 2068/4885MMP3 4754/4885 |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | RER1, NBAS, INTS9 | ESR1 713/4885ESR2 1033/4885MMP3 4706/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.