Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLS | O94925 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | PI4KB | Q9UBF8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10950488 | 0.76 | GSK3B (0.40) | POLBKDM4E | |
| SCHEMBL16366959 | 0.75 | TP53 (0.47) | POLBMAPK1 | |
| SCHEMBL5174001 | 0.75 | F2 (0.34) | GLSPOLBPI4KB | |
| SCHEMBL14093932 | 0.73 | GLS (0.36) | GLS | |
| SCHEMBL10983494 | 0.73 | MMP3 (0.49) | — | |
| SCHEMBL10982313 | 0.73 | MMP3 (0.49) | — | |
| SCHEMBL17691535 | 0.71 | LMNA (0.45) | — | |
| SCHEMBL11035316 | 0.69 | ALDH1A1 (0.51) | KDM4E | |
| SCHEMBL5156822 | 0.64 | NUDT1 (0.38) | GLSPOLB | |
| SCHEMBL11559131 | 0.63 | TP53 (0.66) | POLBKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230004085-A1 | METHOD FOR MANUFACTURING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PREMIX SOLUTION FOR PREPARING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, METHOD FOR MANUFACTURING PHOTOSENSITIVE DRY FILM, AND METHOD FOR MANUFACTURING PATTERNED RESIST FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-05 | — | — | US | disclosed |
| US-11543749-B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-03 | — | — | US | disclosed |
| US-20210278765-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-09 | — | — | US | disclosed |
| US-10969685-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-04-06 | — | — | US | disclosed |
| US-20200209749-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-02 | — | — | US | disclosed |
| US-10365560-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-30 | — | — | US | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-9740097-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291466-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291467-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291465-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20150086927-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-26 | — | — | US | disclosed |
| US-4517361-A | BACTERICIDES | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1985-05-14 | — | — | US | disclosed |
| US-4421912-A | BACTERICIDES | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1983-12-20 | — | — | US | disclosed |
| US-4379924-A | Cephalosporin derivatives | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1983-04-12 | — | — | US | disclosed |
| US-4080498-A | ANTIBIOTICS, BACTERICIDES | TAKEDA CHEMICAL INDUSTRIES, LTD. (JA) | 1978-03-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200209749-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HACL2, NEK10, ACAD10 | GLS 3234/4885POLB 964/4885KDM4E 1423/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.