Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 5/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | MAOA | P21397 | 3/20 | 0.41 |
| ▸ | MAOB | P27338 | 2/20 | 0.41 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.40 |
| ▸ | BAX | Q07812 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | STS | P08842 | 1/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.35 |
| ▸ | MMP3 | P08254 | 1/20 | 0.35 |
| ▸ | MMP8 | P22894 | 1/20 | 0.35 |
| ▸ | MMP13 | P45452 | 1/20 | 0.35 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.34 |
| ▸ | SOS1 | Q07889 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3285418 | 0.89 | LTA4H (0.55) | LTA4HTSHRMAOAMAOBNR1H2 | |
| SCHEMBL20367129 | 0.87 | LTA4H (0.60) | LTA4HTSHRMAOAMAOBNR1H2 | |
| SCHEMBL544383 | 0.87 | MAOA (0.50) | TSHRMAOAMAOBNR1H2SMN1; SMN2 | |
| SCHEMBL25895028 | 0.87 | MAOA (0.50) | TSHRMAOAMAOBNR1H2SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL9007558 | 0.84 | MAOA (0.48) | TSHRMAOAMAOBNR1H2SMN1; SMN2 | |
| SCHEMBL12871225 | 0.84 | LTA4H (0.63) | LTA4HTSHRMAOANR1H2BAX | |
| SCHEMBL6357397 | 0.84 | LTA4H (0.63) | LTA4HTSHRMAOANR1H2BAX | |
| Fluoride SCHEMBL27764069 | 0.82 | MAOA (0.46) | TSHRMAOAMAOBNR1H2SMN1; SMN2 | |
| Diphenylether SCHEMBL8749832 | 0.82 | LTA4H (0.67) | LTA4HTSHRMAOAMAOBNR1H2 | |
| SCHEMBL487535 | 0.82 | LTA4H (0.67) | LTA4HTSHRMAOAMAOBNR1H2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12024579-B2 | Curable liquid composition, particulate filler, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-02 | — | — | US | disclosed |
| CN-113402657-B | Photopolymerization initiator containing aryl iodonium salt for dental photocurable composition | 株式会社松风 | 2024-06-11 | — | — | CN | disclosed |
| CN-112470551-B | Sealing agent for organic electroluminescent display element | 电化株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-113227159-B | Composition and method for producing the same | 电化株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-110007557-B | Curable composition, film, optical film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2024-04-12 | — | — | CN | disclosed |
| EP-3881818-B1 | DENTAL PHOTOCURABLE COMPOSITIONS COMPRISING PHOTOPOLYMERIZATION INITIATOR COMPRISING AN ARYLIODONIUM SALT | SHOFU KK (JP) | 2024-03-06 | — | — | EP | disclosed |
| US-20240045330-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-117510794-A | Composition and method for producing the same | 电化株式会社 | 2024-02-06 | — | — | CN | disclosed |
| US-20240027901-A1 | PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION USING SAME | SAN-APRO LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| CN-117420731-A | Negative photosensitive composition and pattern forming method | 东京应化工业株式会社 | 2024-01-19 | — | — | CN | disclosed |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | SAN-APRO, LTD (JP) | 2011-12-08 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-2239295-A2 | Radiation-curable silicone composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100255417-A1 | RADIATION-CURABLE SILICONE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20090163723-A1 | METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE | SAN-APRO LIMITED (JP) | 2009-06-25 | — | — | US | disclosed |
| EP-1953139-A1 | METHOD FOR PRODUCING FLUORINATED SULFONIUM ALKYLFLUOROPHOSPHATE | San-Apro Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240027901-A1 | PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION USING SAME | ATIC, MAP1LC3C, TYR | LTA4H 1851/4885TSHR 2891/4885MAOA 580/4885 |
| US-20090163723-A1 | METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE | ARSA, SCO2, DOHH | LTA4H 2313/4885TSHR 158/4885MAOA 2326/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | LTA4H 3043/4885TSHR 1928/4885MAOA 4685/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | LTA4H 4646/4885TSHR 753/4885MAOA 2341/4885 |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | ASIC1, H1-0, IK | LTA4H 2072/4885TSHR 3005/4885MAOA 4359/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.