SCHEMBL1127531

SCHEMBL1127531

COc1ccc(CSCc2ccccc2)cc1

nearest known ligand 0.67

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.67
SIGMAR1 Q99720 1/20 0.55
CA4 P22748 1/20 0.52
IDO1 P14902 3/20 0.52
HTT P42858 1/20 0.51
EPHX1 P07099 1/20 0.50
MAPT P10636 1/20 0.49
CTSB P07858 1/20 0.49
APP P05067 1/20 0.49
ALDH1A1 P00352 1/20 0.48
TP53 P04637 1/20 0.48
CYP3A4 P08684 1/20 0.48
ALOX15 P16050 1/20 0.48
TSHR P16473 1/20 0.48
ALOX12 P18054 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL62037 0.91 IDO1 (0.59) LTA4HIDO1APPALDH1A1TP53
SCHEMBL27685865 0.91 LTA4H (0.56) LTA4HSIGMAR1CA4IDO1HTT
SCHEMBL27654551 0.91 LTA4H (0.56) LTA4HSIGMAR1CA4IDO1HTT
Hydrochloric Acid SCHEMBL5797813 0.89 IDO1 (0.60) LTA4HIDO1APPALDH1A1TP53
SCHEMBL6624910 0.89 IDO1 (0.57) LTA4HIDO1APPALDH1A1TP53
SCHEMBL27563914 0.89 LTA4H (0.58) LTA4HSIGMAR1HTTCYP3A4SMN1; SMN2
SCHEMBL13905830 0.84 L3MBTL1 (0.54) LTA4HSIGMAR1IDO1HTTEPHX1
SCHEMBL11018642 0.83 L3MBTL1 (0.56) LTA4HSIGMAR1ALDH1A1CYP3A4ALOX15
SCHEMBL22315702 0.82 LTA4H (0.46) LTA4HSIGMAR1IDO1HTTEPHX1
SCHEMBL8406865 0.82 CALM1 (0.63) LTA4HIDO1MAPTAPPSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0331496-B1 POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1992-09-16 EP claimed
US-20260139710-A1 BEARING DEVICE, METHOD OF MANUFACTURING BEARING DEVICE, HARD DISK DRIVE DEVICE, AND MOTOR MINEBEA MITSUMI INC (JP) 2026-05-21 US disclosed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD CANON KK (JP) 2026-04-30 US disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
EP-4691782-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-11 EP disclosed
CN-101046630-A Radiation sensibility composition for forming staining layer, color filter and color liquid crystal display element JSR CORP (JP) 2007-10-03 CN disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed
CN-1912008-A Resin composition, protection film of color filter and forming method thereof JSR CORP (JP) 2007-02-14 CN disclosed
CN-1854895-A Radiation sensitive resin composite, prominency formed therewith, separator and its producing method and liquid crystal display component JSR CORP (JP) 2006-11-01 CN disclosed
CN-1841194-A X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display element JSR CORP (JP) 2006-10-04 CN disclosed
CN-1789296-A Copolymer, resin composition, protective film, and method for forming protective film JSR CORP (JP) 2006-06-21 CN disclosed
WO-2006013989-A1 CURABLE TRIAZINE COMPOSITION FOR ELECTRONIC COMPONENTS, PRODUCTION METHOD THEREFOR AND CURED PRODUCT THEREOF SHOWA DENKO K.K. (JP) 2006-02-09 WO disclosed
EP-0664316-A1 Polycarbonate composition having improved resistance to gamma-ray radiation TEIJIN LIMITED (JP) 1995-07-26 EP disclosed
US-5254664-A Containing a 2-oxazoline group; molding materials NIPPON SHOKUBAI CO., LTD. (JP) 1993-10-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 LTA4H 1361/4885SIGMAR1 1303/4885CA4 362/4885
US-20260139710-A1 BEARING DEVICE, METHOD OF MANUFACTURING BEARING DEVICE, HARD DISK DRIVE DEVICE, AND MOTOR ZW10, SOD1, EED LTA4H 3729/4885SIGMAR1 4232/4885CA4 2878/4885
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD ASIC1, PTGER1, PELP1 LTA4H 496/4885SIGMAR1 2502/4885CA4 1134/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 LTA4H 783/4885SIGMAR1 1998/4885CA4 381/4885
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS LTA4H 4646/4885SIGMAR1 3765/4885CA4 1675/4885
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT1, MLLT3, ERCC1 LTA4H 1109/4885SIGMAR1 2054/4885CA4 493/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.