Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.33 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | ADH1B | P00325 | 1/20 | 0.31 |
| ▸ | ADH1C | P00326 | 1/20 | 0.31 |
| ▸ | ADH1A | P07327 | 1/20 | 0.31 |
| ▸ | ADH7 | P40394 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11863562 | 0.95 | MAOB (0.37) | MAOBCALM1SMN1; SMN2GAATSHR | |
| Bromide SCHEMBL11619420 | 0.93 | MAOB (0.36) | MAOBCALM1SMN1; SMN2GAATSHR | |
| SCHEMBL9496784 | 0.90 | MAOB (0.33) | MAOBCALM1SMN1; SMN2GAATSHR | |
| SCHEMBL6915524 | 0.78 | SMN1; SMN2 (0.37) | MAOBCALM1SMN1; SMN2GAATSHR | |
| SCHEMBL11530031 | 0.78 | LMNA (0.41) | ALDH1A1HPGDHSD17B10CNR2 | |
| SCHEMBL247179 | 0.77 | CALM1 (0.50) | MAOBCALM1SMN1; SMN2TSHRALDH1A1 | |
| Bromide SCHEMBL10885367 | 0.75 | CALM1 (0.47) | MAOBCALM1SMN1; SMN2TSHRALDH1A1 | |
| Iodide SCHEMBL10884305 | 0.75 | CALM1 (0.47) | MAOBCALM1SMN1; SMN2TSHRALDH1A1 | |
| SCHEMBL9651699 | 0.71 | ALDH1A1 (0.38) | ALDH1A1 | |
| SCHEMBL9498864 | 0.70 | CALM1 (0.43) | MAOBCALM1SMN1; SMN2TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0544842-A4 | ELECTRON BEAM CURABLE EPOXY COMPOSITIONS | — | 1993-07-21 | — | — | EP | claimed |
| EP-0544842-A1 | ELECTRON BEAM CURABLE EPOXY COMPOSITIONS | CRIVELLO, James V. (US) | 1993-06-09 | — | — | EP | claimed |
| EP-0316525-B1 | POLYAMIDE REVERSE OSMOSIS MEMBRANES | THE DOW CHEMICAL COMPANY (US) | 1992-12-02 | — | — | EP | claimed |
| WO-1992012183-A1 | ELECTRON BEAM CURABLE EPOXY COMPOSITIONS | CRIVELLO JAMES V (US) | 1992-07-23 | — | — | WO | claimed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| CN-117716295-A | Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| US-11926581-B2 | Sulfonium salt, photoacid generator, curable composition, and resist composition | SAN-APRO LIMITED (JP) | 2024-03-12 | — | — | US | disclosed |
| CN-117460995-A | Composition for forming underlayer film of silicon-containing resist | 日产化学株式会社 | 2024-01-26 | — | — | CN | disclosed |
| WO-2024019064-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| WO-2024009993-A1 | METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2024-01-11 | — | — | WO | disclosed |
| US-20230100642-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | SAN-APRO LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| EP-4122915-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | San-Apro Ltd. (JP) | 2023-01-25 | — | — | EP | disclosed |
| EP-2284165-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | SAN APRO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-2399905-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | San-Apro Limited (JP) | 2011-12-28 | — | — | EP | disclosed |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | SAN-APRO, LTD (JP) | 2011-12-08 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-0331496-B1 | POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1992-09-16 | — | — | EP | disclosed |
| EP-0331496-A1 | Polyfluoride sulfonium compounds and polymerization initiator thereof | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1989-09-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | MAOB 4143/4885CALM1 2089/4885SMN1; SMN2 1788/4885 |
| US-11926581-B2 | Sulfonium salt, photoacid generator, curable composition, and resist composition | H1-0, SPIN1, IK | MAOB 4156/4885CALM1 1621/4885SMN1; SMN2 1364/4885 |
| US-20230100642-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | TIPRL, SPIN1, SPIN2B | MAOB 4673/4885CALM1 1195/4885SMN1; SMN2 1402/4885 |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | ASIC1, H1-0, IK | MAOB 4253/4885CALM1 2246/4885SMN1; SMN2 2221/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.